SCHEMBL1780867

SCHEMBL1780867

CCOCC(OCC)C(C)C(=O)O

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.37
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5827578 0.81 LMNA (0.42) LMNA
SCHEMBL11852717 0.78 LMNA (0.39) LMNA
SCHEMBL28065149 0.78 CHRM1 (0.43) LMNATSHR
SCHEMBL17853856 0.75 LMNA (0.47) LMNA
SCHEMBL19408671 0.72 PPARA (0.41) TSHR
SCHEMBL8903595 0.72 PPARA (0.41) TSHR
SCHEMBL27898521 0.72 LMNA (0.33) LMNA
SCHEMBL566390 0.72 LMNA (0.39) LMNA
SCHEMBL156205 0.72
SCHEMBL15866578 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102460300-B Photopolymerizable resin composition KOLON INC 2013-11-06 CN disclosed
US-8574794-B2 Photosensitive resin composition KOLON INDUSTRIES, INC. (KR) 2013-11-05 US disclosed
CN-102460300-A Photopolymerizable resin composition KOLON INC 2012-05-16 CN disclosed
US-20110117498-A1 PHOTOSENSITIVE RESIN COMPOSITION KOLON INDUSTRIES, INC (KR) 2011-05-19 US disclosed
WO-2010151078-A9 PHOTOPOLYMERIZABLE RESIN COMPOSITION KOLON INDUSTRIES, INC. (KR) 2011-03-03 WO disclosed
WO-2010151078-A2 PHOTOPOLYMERIZABLE RESIN COMPOSITION KOLON INDUSTRIES, INC. (KR) 2010-12-29 WO disclosed