Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17812629 | 0.85 | NPSR1 (0.38) | NPSR1CYP19A1KMT2AMEN1NPC1 | |
| SCHEMBL18905355 | 0.83 | CYP19A1 (0.39) | CYP19A1NPC1RAB9AMAPTALDH1A1 | |
| SCHEMBL17812635 | 0.77 | CYP19A1 (0.33) | NPSR1CYP19A1KMT2AMEN1NPC1 | |
| SCHEMBL17812781 | 0.76 | KMT2A (0.43) | NPSR1KMT2AMEN1TP53CYP2C9 | |
| SCHEMBL17812628 | 0.75 | KMT2A (0.45) | NPSR1KMT2AMEN1TP53MAPT | |
| SCHEMBL13918201 | 0.74 | ALDH1A1 (0.37) | NPSR1KMT2AMEN1NPC1RAB9A | |
| SCHEMBL18014638 | 0.68 | ALDH1A1 (0.42) | NPSR1KMT2AMEN1MAPTCYP2C9 | |
| SCHEMBL17812779 | 0.68 | NPSR1 (0.36) | NPSR1KMT2AMEN1CYP2C9ALDH1A1 | |
| SCHEMBL14665260 | 0.68 | NPC1 (0.47) | NPSR1KMT2AMEN1NPC1RAB9A | |
| SCHEMBL13934892 | 0.67 | RORC (0.43) | NPSR1KMT2AMEN1MAPTCYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9904172-B2 | Shrink material and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20160229939-A1 | SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160161850-A1 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-09 | — | — | US | disclosed |