Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | VDR | P11473 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17812748 | 0.84 | KMT2A (0.38) | NPSR1KMT2AMEN1TSHRALDH1A1 | |
| SCHEMBL18905354 | 0.82 | VDR (0.36) | KMT2AMEN1VDR | |
| SCHEMBL17812620 | 0.76 | HSD17B10 (0.34) | NPSR1KMT2AMEN1VDRALDH1A1 | |
| SCHEMBL13918202 | 0.72 | ALDH1A1 (0.38) | NPSR1KMT2AMEN1TSHRALDH1A1 | |
| SCHEMBL15179715 | 0.72 | MEN1 (0.34) | NPSR1KMT2AMEN1TSHRALDH1A1 | |
| SCHEMBL18802868 | 0.72 | NPSR1 (0.37) | NPSR1TSHRALDH1A1HPGDALOX15 | |
| SCHEMBL19164567 | 0.72 | ALDH1A1 (0.43) | NPSR1KMT2ATSHRALDH1A1CYP2C9 | |
| SCHEMBL10204898 | 0.70 | ALOX15 (0.41) | NPSR1KMT2AMEN1TSHRALDH1A1 | |
| SCHEMBL18014638 | 0.70 | ALDH1A1 (0.42) | NPSR1KMT2AMEN1TSHRALDH1A1 | |
| SCHEMBL13934892 | 0.69 | RORC (0.43) | NPSR1KMT2AMEN1TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9904172-B2 | Shrink material and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20160229939-A1 | SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160161850-A1 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-09 | — | — | US | disclosed |