Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NCEH1 | Q6PIU2 | 6/20 | 0.52 |
| ▸ | CES2 | O00748 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | PGR | P06401 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20483693 | 0.94 | NCEH1 (0.63) | NCEH1 | |
| SCHEMBL20484011 | 0.92 | NCEH1 (0.47) | NCEH1CES2SMN1; SMN2HPGDMAPT | |
| SCHEMBL20483896 | 0.92 | NCEH1 (0.45) | NCEH1HPGDMAPTALDH1A1KDM4E | |
| SCHEMBL20483898 | 0.92 | NCEH1 (0.45) | NCEH1HPGDMAPTALDH1A1KDM4E | |
| SCHEMBL20484103 | 0.91 | NCEH1 (0.44) | NCEH1CES2SMN1; SMN2HPGDMAPT | |
| SCHEMBL20483934 | 0.91 | NCEH1 (0.44) | NCEH1CES2SMN1; SMN2HPGDALDH1A1 | |
| SCHEMBL20484009 | 0.91 | NCEH1 (0.44) | NCEH1CES2SMN1; SMN2 | |
| SCHEMBL20483932 | 0.89 | NCEH1 (0.43) | NCEH1CES2SMN1; SMN2MAPK1 | |
| SCHEMBL20484104 | 0.85 | NCEH1 (0.43) | NCEH1SMN1; SMN2KDM4EKMT2A | |
| SCHEMBL20553821 | 0.84 | NCEH1 (0.36) | NCEH1CES2SMN1; SMN2KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3622511-B1 | HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMERIC COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2022-04-27 | — | — | EP | disclosed |
| EP-3622512-B1 | FILM STRUCTURE COMPRISING A PHOTOPOLYMER COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2022-04-27 | — | — | EP | disclosed |
| US-11267943-B2 | Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance | COVESTRO DEUTSCHLAND AG (DE) | 2022-03-08 | — | — | US | disclosed |
| US-20210292505-A1 | FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE | COVESTRO DEUTSCHLAND AG (DE) | 2021-09-23 | — | — | US | disclosed |
| US-20200166888-A1 | HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A HIGHLY RESISTANT COATING LAYER | COVESTRO DEUTSCHLAND AG (DE) | 2020-05-28 | — | — | US | disclosed |
| EP-3622512-A1 | FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE | Covestro Deutschland AG (DE) | 2020-03-18 | — | — | EP | disclosed |
| US-10241402-B2 | Naphthyl acrylates as writing monomers for photopolymers | COVESTRO DEUTSCHLAND AG (DE) | 2019-03-26 | — | — | US | disclosed |
| EP-3401910-A1 | HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMERIC COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | Covestro Deutschland AG (DE) | 2018-11-14 | — | — | EP | disclosed |
| EP-3401909-A1 | FILM STRUCTURE COMPRISING A PHOTOPOLYMER COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | Covestro Deutschland AG (DE) | 2018-11-14 | — | — | EP | disclosed |
| EP-3230261-B1 | NAPHTHYL ACRYLATE AS WRITE MONOMERS FOR PHOTOPOLYMERS | COVESTRO DEUTSCHLAND AG (DE) | 2018-09-05 | — | — | EP | disclosed |
| US-20170363957-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | COVESTRO DEUTSCHLAND AG (DE) | 2017-12-21 | — | — | US | disclosed |
| EP-3230261-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | Covestro Deutschland AG (DE) | 2017-10-18 | — | — | EP | disclosed |
| WO-2016091965-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | COVESTRO DEUTSCHLAND AG (DE) | 2016-06-16 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170363957-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | NEFM, ACR, DIAPH1 | NCEH1 4259/4885CES2 1466/4885SMN1; SMN2 3356/4885 |
| US-10241402-B2 | Naphthyl acrylates as writing monomers for photopolymers | NEFM, ACR, DIAPH1 | NCEH1 4259/4885CES2 1466/4885SMN1; SMN2 3356/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.