SCHEMBL17826764

SCHEMBL17826764

CCOC12CC3OC(=O)C(C1)C3C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22459495 0.72 NAAA (0.32) —
SCHEMBL9883224 0.68 — —
SCHEMBL18893181 0.62 NAAA (0.33) —
SCHEMBL12414982 0.62 NAAA (0.33) —
SCHEMBL17448264 0.61 — —
SCHEMBL1397825 0.59 NPSR1 (0.47) —
SCHEMBL17827198 0.58 — —
SCHEMBL270387 0.58 NPSR1 (0.43) —
SCHEMBL15960840 0.56 TK1 (0.33) —
SCHEMBL15275717 0.56 ICAM1 (0.31) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3032332-A2 SHRINK MATERIAL AND PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2016-06-15 — — EP disclosed
Send feedback