SCHEMBL17827735

SCHEMBL17827735

CC(F)(F)C(=O)OCCOC(=O)C12CC3CC(C1)C1(OCCO1)C(C3)C2

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.37
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
ATM Q13315 1/20 0.36
NPSR1 Q6W5P4 2/20 0.34
CYP17A1 P05093 3/20 0.34
CYP19A1 P11511 3/20 0.34
MAPT P10636 1/20 0.33
PRKCA P17252 1/20 0.33
LMNA P02545 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
POLB P06746 1/20 0.31
GAA P10253 1/20 0.31
TSHR P16473 1/20 0.31
MAPK1 P28482 1/20 0.31
KDM4E B2RXH2 1/20 0.30
RECQL P46063 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17827734 0.91 ALDH1A1 (0.35) ALDH1A1MEN1KMT2AATMNPSR1
SCHEMBL17827736 0.90 ALDH1A1 (0.32) ALDH1A1MEN1KMT2AATMNPSR1
SCHEMBL17899090 0.88 MEN1 (0.35) ALDH1A1MEN1KMT2AATMNPSR1
SCHEMBL17831320 0.85 ALDH1A1 (0.33) ALDH1A1MEN1KMT2AATMNPSR1
SCHEMBL17827756 0.85 ALDH1A1 (0.35) ALDH1A1MEN1KMT2AATMNPSR1
SCHEMBL6357099 0.85 ALDH1A1 (0.47) ALDH1A1MEN1KMT2AATMNPSR1
SCHEMBL17899099 0.84 MEN1 (0.34) ALDH1A1MEN1KMT2AATMNPSR1
SCHEMBL12932552 0.84 ALDH1A1 (0.38) ALDH1A1MEN1KMT2AATMNPSR1
SCHEMBL17792413 0.83 MEN1 (0.33) ALDH1A1MEN1KMT2ANPSR1
SCHEMBL12972074 0.81 ALDH1A1 (0.44) ALDH1A1MEN1KMT2AATMNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9645490-B2 Salt, acid generator, photoresist composition, and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-05-09 US disclosed
US-20160170298-A1 SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160170298-A1 SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN FGFR1, PKD1, KCNA1 ALDH1A1 537/4885MEN1 1163/4885KMT2A 139/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.