SCHEMBL17899090

SCHEMBL17899090

CC(F)(F)C(=O)OCC(F)(F)C(F)(F)COC(=O)C12CC3CC(C1)C1(OCCO1)C(C3)C2

nearest known ligand 0.35

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.35
ALDH1A1 P00352 2/20 0.35
KMT2A Q03164 2/20 0.35
ATM Q13315 1/20 0.35
CYP17A1 P05093 2/20 0.33
CYP19A1 P11511 2/20 0.33
MAPT P10636 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
PRKCA P17252 1/20 0.32
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30
POLB P06746 1/20 0.30
GAA P10253 1/20 0.30
TSHR P16473 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17899099 0.96 MEN1 (0.34) MEN1ALDH1A1KMT2AATMCYP17A1
SCHEMBL17899089 0.91 ALDH1A1 (0.34) MEN1ALDH1A1KMT2AATMCYP17A1
SCHEMBL17899093 0.90 MEN1 (0.31) MEN1ALDH1A1KMT2AATM
SCHEMBL17827735 0.88 ALDH1A1 (0.37) MEN1ALDH1A1KMT2AATMCYP17A1
SCHEMBL12932552 0.87 ALDH1A1 (0.38) MEN1ALDH1A1KMT2AATMCYP17A1
SCHEMBL17902873 0.86 MEN1 (0.31) MEN1ALDH1A1KMT2AATMCYP17A1
SCHEMBL18031811 0.85 ALDH1A1 (0.34) MEN1ALDH1A1KMT2AATMCYP17A1
SCHEMBL17899100 0.85 ALDH1A1 (0.42) MEN1ALDH1A1KMT2AATMCYP17A1
SCHEMBL17828628 0.82 ALDH1A1 (0.37) MEN1ALDH1A1KMT2AATMCYP17A1
SCHEMBL17902871 0.82 PKM (0.31) MEN1ALDH1A1KMT2AATMCYP17A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9575408-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-21 US disclosed
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-07-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN RER1, LCP1, COL1A1 MEN1 1607/4885ALDH1A1 914/4885KMT2A 1576/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.