SCHEMBL17829491

SCHEMBL17829491

C=C(C)C(=O)OCCC(=O)CC1C2CC3C1OC(=O)C3C2C(=O)OC

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16187158 0.90 KMT2A (0.33) MEN1KMT2A
SCHEMBL18365491 0.85 TSHR (0.34) MEN1KMT2A
SCHEMBL92307 0.85 ALDH1A1 (0.39) MEN1KMT2A
SCHEMBL15496106 0.83 KMT2A (0.35) MEN1KMT2A
SCHEMBL92252 0.82 ALDH1A1 (0.30) MEN1KMT2A
SCHEMBL12884356 0.81 THRB (0.36) MEN1KMT2A
SCHEMBL17921277 0.80 ALDH1A1 (0.33) MEN1KMT2A
SCHEMBL18623593 0.80 ALDH1A1 (0.34) MEN1KMT2A
SCHEMBL12416012 0.80
SCHEMBL19062657 0.78 HTT (0.34) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160168296-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-16 US disclosed
US-20160168296-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-16 US disclosed