⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17832113 | 0.86 | — | — | |
| SCHEMBL17832114 | 0.85 | — | — | |
| SCHEMBL17830195 | 0.85 | HTT (0.33) | — | |
| SCHEMBL17830214 | 0.85 | ALDH1A1 (0.31) | — | |
| SCHEMBL17832175 | 0.83 | ALDH1A1 (0.31) | — | |
| SCHEMBL11911303 | 0.81 | — | — | |
| SCHEMBL17830197 | 0.80 | — | — | |
| SCHEMBL31341453 | 0.80 | THRB (0.32) | — | |
| SCHEMBL17832160 | 0.78 | ALDH1A1 (0.36) | — | |
| SCHEMBL12129821 | 0.77 | CYP4F2 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9740102-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20160170300-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |