SCHEMBL17832175

SCHEMBL17832175

CCC(C)(COC(=O)C(C)C)C(=O)OCC(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
POLB P06746 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17832157 0.86 PRKCA (0.33)
SCHEMBL25753306 0.86
SCHEMBL17545733 0.84 HTT (0.39) ALDH1A1POLBMAPT
SCHEMBL17832158 0.83
SCHEMBL16525497 0.79 HTT (0.38) ALDH1A1POLBMAPT
SCHEMBL17830214 0.78 ALDH1A1 (0.31) ALDH1A1POLBMAPT
SCHEMBL17830198 0.78 PRKCA (0.32) ALDH1A1POLBMAPT
SCHEMBL17830195 0.78 HTT (0.33) ALDH1A1POLBMAPT
SCHEMBL17832188 0.78 PRKCA (0.32) ALDH1A1POLBMAPT
SCHEMBL14362137 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740102-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160170300-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed