SCHEMBL17832159

SCHEMBL17832159

CCC(C)(COC(=O)C12CC3CC(CC(C3)C1)C2)C(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.35
ALDH1A1 P00352 4/20 0.33
NPSR1 Q6W5P4 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
MAPT P10636 1/20 0.33
CYP17A1 P05093 2/20 0.32
CYP19A1 P11511 2/20 0.32
ATM Q13315 1/20 0.32
LMNA P02545 1/20 0.31
EPHX2 P34913 1/20 0.31
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17830206 0.88 PRKCA (0.39) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL17830191 0.88 PRKCA (0.39) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL17832177 0.86 PRKCA (0.38) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL17830199 0.83 PRKCA (0.36) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL15853239 0.83 CYP17A1 (0.37) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL15853230 0.82 ALDH1A1 (0.37) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL15853237 0.81 ALDH1A1 (0.36) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL15853232 0.79 ALDH1A1 (0.34) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL17832113 0.79
SCHEMBL15853233 0.78 ALDH1A1 (0.34) PRKCAALDH1A1NPSR1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740102-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160170300-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed