SCHEMBL17837970

SCHEMBL17837970

Cc1cccc(-c2ccc(C)c(-c3cccc(C)c3)c2O)c1.OC1CCC2CC12

nearest known ligand 0.35

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ ACLY P53396 1/20 0.35
▸ AKR1C3 P42330 1/20 0.35
▸ AKR1C2 P52895 1/20 0.35
▸ CNR2 P34972 4/20 0.34
▸ CNR1 P21554 3/20 0.34
▸ PDK2 Q15119 2/20 0.33
▸ MAOA P21397 1/20 0.33
▸ KDM1A O60341 1/20 0.33
▸ RPS6KA3 P51812 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ LDHA P00338 1/20 0.32
▸ LDHB P07195 1/20 0.32
▸ DRD2 P14416 1/20 0.32
▸ DRD1 P21728 1/20 0.32
▸ HTR2A P28223 1/20 0.32
▸ ALOX15 P16050 1/20 0.32
▸ ALOX12 P18054 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17837973 0.92 ACLY (0.34) ACLYAKR1C3AKR1C2CNR2CNR1
SCHEMBL28805540 0.88 PDK2 (0.34) ACLYCNR2CNR1PDK2KDM1A
SCHEMBL17837968 0.86 CNR2 (0.36) ACLYCNR2CNR1KDM1AL3MBTL1
SCHEMBL27917879 0.85 CNR2 (0.36) ACLYCNR2CNR1PDK2KDM1A
SCHEMBL27917878 0.84 CA12 (0.38) CNR2CNR1PDK2KDM1ALDHA
Ethane SCHEMBL28200321 0.80 CNR2 (0.41) CNR2CNR1PDK2KDM1ADRD1
SCHEMBL27546435 0.79 ACHE (0.44) MAOAKDM1A
SCHEMBL17838046 0.76 ELANE (0.33) —
SCHEMBL27917880 0.74 MAOA (0.36) MAOAKDM1A
SCHEMBL17838032 0.73 MAOA (0.35) MAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9765175-B2 Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating DIC CORPORATION (JP) 2017-09-19 — — US disclosed
US-20160177020-A1 MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING DIC CORPORATION (JP) 2016-06-23 — — US disclosed
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