SCHEMBL178647

SCHEMBL178647

CCC(C)(C)CC(C)(C(=O)OC)C(C)(C)CC

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.34
ALDH1A1 P00352 1/20 0.30
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15743555 0.90 ALDH1A1 (0.32) DGAT1ALDH1A1
SCHEMBL15450703 0.90 DGAT1 (0.31) DGAT1
SCHEMBL10093689 0.88 DGAT1 (0.34) DGAT1ALDH1A1POLB
SCHEMBL178785 0.88 DGAT1 (0.34) DGAT1ALDH1A1POLB
SCHEMBL14355440 0.88 DGAT1 (0.34) DGAT1ALDH1A1POLB
SCHEMBL14499263 0.86 ALDH1A1 (0.32) DGAT1ALDH1A1
SCHEMBL12156823 0.86 DGAT1 (0.33) DGAT1
SCHEMBL18488705 0.86 DGAT1 (0.33) DGAT1
SCHEMBL25612819 0.85 DGAT1 (0.38) DGAT1ALDH1A1POLB
SCHEMBL15714037 0.84 ALDH1A1 (0.33) DGAT1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 158 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170364177-A1 TRANSFER FILM, ELECTRODE PROTECTIVE FILM FOR ELECTROSTATIC CAPACITANCE-TYPE INPUT DEVICE, LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND ELECTROSTATIC CAPACITANCE-TYPE INPUT DEVICE FUJIFILM CORPORATION (JP) 2017-12-21 US disclosed
US-20170349686-A1 PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-12-07 US disclosed
US-20170334165-A1 TRANSFER FILM, TRANSPARENT LAMINATE, ELECTROSTIATIC CAPACITANCE-TYPE INPUT DEVICE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2017-11-23 US disclosed
US-9818778-B2 Solid-state image sensor and its manufacturing method, curable composition for forming infrared cut-off filters, and camera module FUJIFILM CORPORATION (JP) 2017-11-14 US disclosed
US-9797886-B2 Agglutination enhancer WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2017-10-24 US disclosed
US-20170277055-A1 DISPERSANT FOR LIQUID DEVELOPMENT, LIQUID DEVELOPER, LIQUID DEVELOPER CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD FUJI XEROX CO., LTD. (JP) 2017-09-28 US disclosed
US-20170220154-A1 TRANSFER FILM, METHOD FOR MANUFACTURING SAME, METHOD FOR MANUFACTURING LAMINATE, METHOD FOR MANUFACTURING CAPACITANCE-TYPE INPUT DEVICE, AND METHOD FOR MANUFACTURING IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2017-08-03 US disclosed
US-9707749-B2 Lithographic printing plate precursor and plate making method thereof FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-9710117-B2 Transfer material, manufacturing method of electrostatic capacitance type input device, electrostatic capacitance type input device, and image display device including the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-20170190167-A1 PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, AND PRINTING METHOD USING SAME FUJIFILM CORPORATION (JP) 2017-07-06 US disclosed
US-20070214987-A1 Lithographic printing plate precursor FUJIFILM CORPORATION 2007-09-20 US disclosed
US-20070212641-A1 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
US-20070212645-A1 Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
US-20070207411-A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2007-09-06 US disclosed
US-20070202443-A1 Method for processing lithographic printing plate precursor, plate inspection method, image quality control method and dyeing aqueous solution used therein FUJIFILM CORPORATION 2007-08-30 US disclosed
US-20070178407-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-08-02 US disclosed
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US disclosed
US-20070128550-A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2007-06-07 US disclosed
US-7165840-B2 Process for producing contact lens having a mark and contact lens having a mark obtained thereby MENICON CO., LTD. (JP) 2007-01-23 US disclosed
US-20070015859-A1 Polyester resin composition containing organic modified layered silicate FUJI PHOTO FILM CO., LTD. 2007-01-18 US disclosed