Fluoride Ion

Fluoride Ion

SCHEMBL17870608

CC[N+](CC)(CC)CCO.[F-]

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.44
NFKB1 P19838 1/20 0.44
KCNA1 Q09470 1/20 0.44
KDM4E B2RXH2 1/20 0.41
PMP22 Q01453 1/20 0.41
ATM Q13315 1/20 0.41
DNM1 Q05193 6/20 0.41
MEN1 O00255 1/20 0.40
LMNA P02545 1/20 0.40
KMT2A Q03164 1/20 0.40
CYP3A4 P08684 1/20 0.40
SLC5A7 Q9GZV3 1/20 0.40
SLC22A1 O15245 1/20 0.32
ALDH1A1 P00352 1/20 0.31
CHRNB2 P17787 1/20 0.30
CHRNB4 P30926 1/20 0.30
CHRNA3 P32297 1/20 0.30
CHRNA7 P36544 1/20 0.30
CHRNA4 P43681 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL476985 0.97 TSHR (0.47) TSHRNFKB1KCNA1KDM4EPMP22
Hydrochloric Acid SCHEMBL715477 0.93 KDM4E (0.50) TSHRNFKB1KCNA1KDM4EPMP22
Bromide SCHEMBL8461151 0.93 MEN1 (0.47) TSHRNFKB1KCNA1KDM4EPMP22
Water SCHEMBL319959 0.93 TSHR (0.44) TSHRNFKB1KCNA1KDM4EPMP22
Iodide SCHEMBL2352341 0.93 TSHR (0.44) TSHRNFKB1KCNA1KDM4EPMP22
Water SCHEMBL27490218 0.93 TSHR (0.44) TSHRNFKB1KCNA1KDM4EPMP22
SCHEMBL1686196 0.90 TSHR (0.47) TSHRNFKB1KCNA1KDM4EPMP22
SCHEMBL1686254 0.90 TSHR (0.47) TSHRNFKB1KCNA1KDM4EPMP22
SCHEMBL10002125 0.87 TSHR (0.44) TSHRNFKB1KCNA1KDM4EPMP22
Water SCHEMBL2032857 0.87 TSHR (0.44) TSHRNFKB1KCNA1KDM4EPMP22

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112480928-A Silicon etching composition and etching method for silicon substrate by using same 利绅科技股份有限公司 2021-03-12 CN claimed
CN-105733587-B Etchant solution and method of use thereof 弗萨姆材料美国有限责任公司 2020-04-03 CN claimed
US-9873833-B2 Etchant solutions and method of use thereof VERSUM MATERIALS US, LLC (US) 2018-01-23 US claimed
EP-3040397-A1 ETCHANT SOLUTIONS AND METHOD OF USE THEREOF AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-07-06 EP claimed
US-20160186058-A1 Etchant Solutions and Method of Use Thereof AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-06-30 US claimed
CN-113287187-B Hafnium Oxide Corrosion Inhibitor 弗萨姆材料美国有限责任公司 2024-12-03 CN disclosed
US-11946148-B2 Hafnium oxide corrosion inhibitor VERSUM MATERIALS US, LLC (US) 2024-04-02 US disclosed
US-20220064803-A1 Hafnium Oxide Corrosion Inhibitor VERSUM MATERIALS US, LLC (US) 2022-03-03 US disclosed
EP-3909068-A1 HAFNIUM OXIDE CORROSION INHIBITOR Versum Materials US, LLC (US) 2021-11-17 EP disclosed
CN-113287187-A Hafnium oxide corrosion inhibitors 弗萨姆材料美国有限责任公司 2021-08-20 CN disclosed
CN-112480928-A Silicon etching composition and etching method for silicon substrate by using same 利绅科技股份有限公司 2021-03-12 CN disclosed
CN-105733587-B Etchant solution and method of use thereof 弗萨姆材料美国有限责任公司 2020-04-03 CN disclosed
US-9873833-B2 Etchant solutions and method of use thereof VERSUM MATERIALS US, LLC (US) 2018-01-23 US disclosed
EP-3040397-A1 ETCHANT SOLUTIONS AND METHOD OF USE THEREOF AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-07-06 EP disclosed
US-20160186058-A1 Etchant Solutions and Method of Use Thereof AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-06-30 US disclosed