Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.44 |
| ▸ | KCNA1 | Q09470 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | DNM1 | Q05193 | 6/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.40 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.30 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.30 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.30 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.30 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL476985 | 0.97 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Water SCHEMBL27490218 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Iodide SCHEMBL2352341 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Hydrochloric Acid SCHEMBL715477 | 0.93 | KDM4E (0.50) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Fluoride Ion SCHEMBL17870608 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Water SCHEMBL2032857 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Bromide SCHEMBL8461151 | 0.93 | MEN1 (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Water SCHEMBL3304873 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL1686254 | 0.90 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL1686196 | 0.90 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 810 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115651162-B | Polyisocyanate composition with low free monomer, high compatibility and good dilution stability and preparation method thereof | 万华化学集团股份有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-118814176-A | Cleaning composition for chip after chemical mechanical polishing, preparation method and application thereof | 浙江奥首材料科技有限公司 | 2024-10-22 | — | — | CN | claimed |
| CN-118652735-A | Low-corrosion chip photoresist cleaning solution and preparation method and application thereof | 江苏奥首材料科技有限公司 | 2024-09-17 | — | — | CN | claimed |
| CN-118339245-A | Polishing slurry composition | 凯斯科技股份有限公司 | 2024-07-12 | — | — | CN | claimed |
| CN-118125467-A | Preparation method and application of Nb-Beta molecular sieve | 中国科学院大连化学物理研究所 | 2024-06-04 | — | — | CN | claimed |
| CN-117946812-A | Cleaning composition | 安集微电子科技（上海）股份有限公司 | 2024-04-30 | — | — | CN | claimed |
| WO-2024083019-A1 | CLEANING COMPOSITION | 安集微电子科技（上海）股份有限公司 | 2024-04-25 | — | — | WO | claimed |
| CN-117761977-A | Corrosion-resistant alkaline developer | 国科天骥(滨州)新材料有限责任公司 | 2024-03-26 | — | — | CN | claimed |
| CN-117106528-A | Semiconductor substrate cleaning liquid composition | JL化学株式会社 | 2023-11-24 | — | — | CN | claimed |
| CN-116661263-A | Low-aluminum corrosion developer and preparation method and application thereof | 艾森半导体材料(南通)有限公司 | 2023-08-29 | — | — | CN | claimed |
| EP-1027415-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | Kyzen Corporation (US) | 2000-08-16 | — | — | EP | claimed |
| WO-1999016855-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | KYZEN CORPORATION (US) | 1999-04-08 | — | — | WO | claimed |
| US-5846695-A | Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-12-08 | — | — | US | claimed |
| US-5693599-A | Flux washing agent | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1997-12-02 | — | — | US | claimed |
| EP-0463423-B1 | Surface treating agent for aluminum line pattern substrate | MITSUBISHI GAS CHEMICAL CO (JP) | 1995-08-30 | — | — | EP | claimed |
| US-5174816-A | SURFACE TREATING AGENT FOR ALUMINUM LINE PATTERN SUBSTRATE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1992-12-29 | — | — | US | claimed |
| EP-0463423-A1 | Surface treating agent for aluminum line pattern substrate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1992-01-02 | — | — | EP | claimed |
| US-4339340-A | HYDROXYLAKYL/TRIALKYLAMMONIUM HYDROXIDE | TOKYO SHIBAURA ELECTRIC CO., LTD. (JP) | 1982-07-13 | — | — | US | claimed |
| US-4239661-A | HYDROXYALKYL TRIALKYLAMMONIUM HYDROXIDE | TOKYO SHIBAURA ELECTRIC CO., LTD. (JP) | 1980-12-16 | — | — | US | claimed |
| US-4172005-A | Method of etching a semiconductor substrate | TOKYO SHIBAURA ELECTRIC CO., LTD. (JP) | 1979-10-23 | — | — | US | claimed |