SCHEMBL1789304

SCHEMBL1789304

O=C(c1ccc(OCCO)cc1)c1ccc(Sc2ccc([S+](c3ccc(OCCO)cc3)c3ccc(OCCO)cc3)cc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.59
NR1I2 O75469 1/20 0.43
L3MBTL1 Q9Y468 6/20 0.41
PPARA Q07869 2/20 0.41
PSMB1 P20618 1/20 0.40
PSMB5 P28074 1/20 0.40
PSMB2 P49721 1/20 0.40
LSS P48449 1/20 0.40
LMNA P02545 4/20 0.39
MAPT P10636 4/20 0.39
HPGD P15428 1/20 0.39
ALDH1A1 P00352 1/20 0.39
RECQL P46063 1/20 0.39
MAPK1 P28482 1/20 0.38
LTA4H P09960 1/20 0.38
HRH2 P25021 1/20 0.37
HRH1 P35367 1/20 0.37
PKM P14618 1/20 0.37
KMT2A Q03164 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1788549 0.95 GAA (0.69) GAAL3MBTL1PPARALSSLMNA
SCHEMBL1792905 0.95 GAA (0.65) GAAL3MBTL1PPARALSSLMNA
SCHEMBL1789124 0.94 GAA (0.52) GAANR1I2L3MBTL1PPARALSS
SCHEMBL18393402 0.91 GAA (0.50) GAANR1I2L3MBTL1PPARAPSMB1
SCHEMBL10225002 0.90 L3MBTL1 (0.55) GAANR1I2L3MBTL1LMNAMAPT
SCHEMBL1127571 0.89 ALDH1A1 (0.47) GAANR1I2L3MBTL1LMNAHPGD
SCHEMBL30513317 0.84 ALDH1A1 (0.42) GAANR1I2L3MBTL1LMNAHPGD
SCHEMBL10248296 0.84 ALDH1A1 (0.55) GAANR1I2PPARALSSHPGD
SCHEMBL31534662 0.84 ALDH1A1 (0.42) GAANR1I2L3MBTL1LMNAHPGD
SCHEMBL28347505 0.83 GAA (0.59) GAANR1I2L3MBTL1PPARAPSMB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8617795-B2 Photosensitive resin composition and pattern forming method using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2013-12-31 US disclosed
EP-2512779-A1 SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS DSM IP Assets B.V. (NL) 2012-10-24 EP disclosed
WO-2011084578-A1 SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS DSM IP ASSETS, B.V. (NL) 2011-07-14 WO disclosed
US-20110123928-A1 Photosensitive Resin Composition and Pattern Forming Method Using the Same TOKYO OHKA KOGYO CO., LTD. (JP) 2011-05-26 US disclosed