SCHEMBL1789124

SCHEMBL1789124

O=C(c1ccc(OCCO)cc1)c1ccc(Sc2ccc([S+](c3ccc(F)cc3)c3ccc(F)cc3)cc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.52
LSS P48449 2/20 0.44
LMNA P02545 3/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
MAOB P27338 2/20 0.40
HRH2 P25021 1/20 0.40
HRH1 P35367 1/20 0.40
PPARG P37231 3/20 0.39
PPARA Q07869 3/20 0.39
HRH3 Q9Y5N1 1/20 0.39
PPARD Q03181 1/20 0.39
ALDH1A1 P00352 3/20 0.39
KDM4E B2RXH2 1/20 0.39
THRB P10828 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
NR1I2 O75469 1/20 0.38
NR4A2 P43354 1/20 0.38
MEN1 O00255 1/20 0.38
HPGD P15428 1/20 0.38
HTT P42858 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1789304 0.94 GAA (0.59) GAALSSLMNAHRH2HRH1
SCHEMBL1792905 0.89 GAA (0.65) GAALSSLMNASMN1; SMN2PPARA
SCHEMBL1788549 0.89 GAA (0.69) GAALSSLMNASMN1; SMN2PPARG
SCHEMBL18393402 0.88 GAA (0.50) GAALSSLMNAHRH2HRH1
SCHEMBL10225002 0.84 L3MBTL1 (0.55) GAALMNAMAOBHRH3ALDH1A1
SCHEMBL1127571 0.84 ALDH1A1 (0.47) GAALMNASMN1; SMN2ALDH1A1THRB
SCHEMBL1787786 0.84 LTA4H (0.47) LMNASMN1; SMN2ALDH1A1KDM4ENPSR1
SCHEMBL1811815 0.84 GAA (0.72) GAALSSLMNASMN1; SMN2MAOB
SCHEMBL1789029 0.82 PTGIR (0.47) GAALMNASMN1; SMN2ALDH1A1KDM4E
SCHEMBL8735605 0.81 GAA (0.52) GAALSSLMNASMN1; SMN2PPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8617795-B2 Photosensitive resin composition and pattern forming method using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2013-12-31 US disclosed
EP-2513722-A1 LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION DSM IP Assets B.V. (NL) 2012-10-24 EP disclosed
EP-2512779-A1 SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS DSM IP Assets B.V. (NL) 2012-10-24 EP disclosed
WO-2011084578-A1 SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS DSM IP ASSETS, B.V. (NL) 2011-07-14 WO disclosed
WO-2011075555-A1 LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION DSM IP ASSETS, B.V. (NL) 2011-06-23 WO disclosed
US-20110123928-A1 Photosensitive Resin Composition and Pattern Forming Method Using the Same TOKYO OHKA KOGYO CO., LTD. (JP) 2011-05-26 US disclosed