Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 1/20 | 0.54 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.45 |
| ▸ | TP53 | P04637 | 2/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | LAP3 | P28838 | 2/20 | 0.42 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.42 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.42 |
| ▸ | GMNN | O75496 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | THPO | P40225 | 1/20 | 0.42 |
| ▸ | MTOR | P42345 | 1/20 | 0.42 |
| ▸ | BLM | P54132 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | CETP | P11597 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | UBE2N | P61088 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11300003 | 1.00 | OPRM1 (0.54) | OPRM1SPHK1TP53CYP2D6LMNA | |
| SCHEMBL9193047 | 1.00 | OPRM1 (0.54) | OPRM1SPHK1TP53CYP2D6LMNA | |
| SCHEMBL11300360 | 1.00 | OPRM1 (0.54) | OPRM1SPHK1TP53CYP2D6LMNA | |
| SCHEMBL1794453 | 1.00 | OPRM1 (0.54) | OPRM1SPHK1TP53CYP2D6LMNA | |
| SCHEMBL9295913 | 1.00 | OPRM1 (0.54) | OPRM1SPHK1TP53CYP2D6LMNA | |
| SCHEMBL11300888 | 1.00 | OPRM1 (0.54) | OPRM1SPHK1TP53CYP2D6LMNA | |
| SCHEMBL11303488 | 0.98 | OPRM1 (0.56) | OPRM1SPHK1TP53CYP2D6LMNA | |
| SCHEMBL3875953 | 0.90 | — | — | |
| SCHEMBL1792732 | 0.88 | FAAH (0.44) | OPRM1SPHK1TP53CYP2D6LMNA | |
| SCHEMBL722493 | 0.84 | DNM1 (0.52) | OPRM1SPHK1TP53CYP2D6LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118179482-A | Vanadium-based catalyst for plasma synergistic catalytic denitration and preparation method and application thereof | 北京化工大学 | 2024-06-14 | — | — | CN | claimed |
| CN-116791385-A | Formula of high-strength plastic rope and production method thereof | 界首市宏利塑料股份有限公司 | 2023-09-22 | — | — | CN | claimed |
| US-20100155108-A1 | Electroless nickel plating solution composition, flexible printed circuit board and manufacturing method thereof | SAMSUNG ELECTRO-MECHANICS CO., LTD. (KR) | 2010-06-24 | — | — | US | claimed |
| US-20030130148-A1 | Cleaning solution for removing photoresist | HYNIX SEMICONDUCTOR INC. (KR) | 2003-07-10 | — | — | US | claimed |
| CN-118179482-A | Vanadium-based catalyst for plasma synergistic catalytic denitration and preparation method and application thereof | 北京化工大学 | 2024-06-14 | — | — | CN | disclosed |
| US-11879181-B2 | Electroplating solution of tin or tin alloy with improved thickness variation of wafer bumps | HOJIN PLATECH CO., LTD. (KR) | 2024-01-23 | — | — | US | disclosed |
| CN-117062949-A | Treatment agent for synthetic fibers, treatment agent 1 for fibers, treatment agent 2 for fibers, aqueous liquid of treatment agent for synthetic fibers, treatment method for fibers, and fibers | 竹本油脂株式会社 | 2023-11-14 | — | — | CN | disclosed |
| CN-116917566-A | Treating agent for synthetic fibers and synthetic fibers | 竹本油脂株式会社 | 2023-10-20 | — | — | CN | disclosed |
| CN-116791385-A | Formula of high-strength plastic rope and production method thereof | 界首市宏利塑料股份有限公司 | 2023-09-22 | — | — | CN | disclosed |
| CN-112501908-B | Treating agent for synthetic fibers and synthetic fibers | 竹本油脂株式会社 | 2023-07-21 | — | — | CN | disclosed |
| US-20230151504-A1 | ELECTROPLATING SOLUTION OF TIN OR TIN ALLOY WITH IMPROVED THICKNESS VARIATION OF WAFER BUMPS | HOJIN PLATECH CO., LTD. (KR) | 2023-05-18 | — | — | US | disclosed |
| CN-112501907-B | Treating agent for synthetic fiber and synthetic fiber | 竹本油脂株式会社 | 2023-01-24 | — | — | CN | disclosed |
| US-20100155108-A1 | Electroless nickel plating solution composition, flexible printed circuit board and manufacturing method thereof | SAMSUNG ELECTRO-MECHANICS CO., LTD. (KR) | 2010-06-24 | — | — | US | disclosed |
| US-7563753-B2 | Cleaning solution for removing photoresist | HYNIX SEMICONDUCTOR INC. (KR) | 2009-07-21 | — | — | US | disclosed |
| US-20030130148-A1 | Cleaning solution for removing photoresist | HYNIX SEMICONDUCTOR INC. (KR) | 2003-07-10 | — | — | US | disclosed |
| EP-0883163-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) | 1998-12-09 | — | — | EP | disclosed |
| US-5741628-A | CHEMICAL AMPLIFICATION WHICH GENERATES AN ACID IN RESPONSE TO LASER RADIATION | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1998-04-21 | — | — | US | disclosed |
| US-5679500-A | FORMING RESIST FILM BY USING A CHEMICAL AMPLIFICATION RESIST WHICH GENERATES AN ACID IN RESPONSE TO LASER LIGHT AND WHICH REACTS WITH THE ACID | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| US-5658711-A | FORMING RESIST FILM CONTAINING BASE GENERATOR, GENERATING BASE BY RADIATION, FORMING METAL OXIDE FILM, ETCHING | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-08-19 | — | — | US | disclosed |
| EP-0691674-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1996-01-10 | — | — | EP | disclosed |