Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | LTB4R | Q15722 | 1/20 | 0.31 |
| ▸ | LTB4R2 | Q9NPC1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16247784 | 0.84 | ALDH1A1 (0.43) | SLC7A5ALDH1A1GAAMAPTTSHR | |
| SCHEMBL16200765 | 0.83 | ALDH1A1 (0.34) | SLC7A5ALDH1A1GAAMAPTTSHR | |
| SCHEMBL17931687 | 0.80 | ALDH1A1 (0.37) | SLC7A5ALDH1A1GAAMAPTTSHR | |
| SCHEMBL20100816 | 0.77 | ALDH1A1 (0.49) | ALDH1A1GAAMAPTTSHR | |
| SCHEMBL16865913 | 0.75 | ALDH1A1 (0.34) | ALDH1A1GAAMAPTTSHR | |
| SCHEMBL13098434 | 0.75 | ESR1 (0.42) | SLC7A5ALDH1A1GAAMAPTTSHR | |
| SCHEMBL825589 | 0.75 | ESR1 (0.42) | SLC7A5ALDH1A1GAAMAPTTSHR | |
| SCHEMBL16139525 | 0.74 | ALDH1A1 (0.44) | SLC7A5ALDH1A1GAAMAPTTSHR | |
| SCHEMBL16683112 | 0.73 | ALDH1A1 (0.41) | SLC7A5ALDH1A1GAAMAPTTSHR | |
| SCHEMBL16247810 | 0.73 | ABCB11 (0.42) | ALDH1A1GAATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |