SCHEMBL17935746

SCHEMBL17935746

CC(C)(c1ccccc1)c1ccc(C(F)(F)F)cc1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.70
TSHR P16473 2/20 0.70
ESR1 P03372 4/20 0.60
ESR2 Q92731 4/20 0.60
CYP3A4 P08684 2/20 0.60
KIF11 P52732 1/20 0.58
TRPV6 Q9H1D0 1/20 0.48
NR3C2 P08235 3/20 0.47
CYP19A1 P11511 1/20 0.46
OPRM1 P35372 1/20 0.46
OPRL1 P41146 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.44
AR P10275 1/20 0.44
HPGD P15428 1/20 0.44
SLC6A2 P23975 1/20 0.44
SLC6A4 P31645 1/20 0.44
HTR6 P50406 1/20 0.44
ESRRG P62508 1/20 0.44
SLC6A3 Q01959 1/20 0.44
HSD17B10 Q99714 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5694455 0.89 TSHR (0.52) ALDH1A1TSHRESR1ESR2CYP3A4
SCHEMBL7535051 0.87 ESR1 (0.75) ALDH1A1TSHRESR1ESR2CYP3A4
Trifluoromethylbenzene SCHEMBL4867878 0.84 TSHR (0.88) ALDH1A1TSHRKIF11TRPV6CYP19A1
Trifluoromethylbenzene SCHEMBL21879063 0.84 TSHR (0.88) ALDH1A1TSHRKIF11TRPV6CYP19A1
Trifluoromethylbenzene SCHEMBL8692 0.84 TSHR (1.00) ALDH1A1TSHRKIF11TRPV6CYP19A1
Trifluoromethylbenzene SCHEMBL175647 0.84 TSHR (1.00) ALDH1A1TSHRKIF11TRPV6CYP19A1
Trifluoromethylbenzene SCHEMBL27760126 0.84 TSHR (1.00) ALDH1A1TSHRKIF11TRPV6CYP19A1
SCHEMBL14910456 0.84 ESR1 (0.70) ALDH1A1TSHRESR1ESR2CYP3A4
SCHEMBL35881 0.84 ESR1 (0.70) ALDH1A1TSHRESR1ESR2CYP3A4
SCHEMBL8317449 0.83 ALDH1A1 (0.67) ALDH1A1TSHRESR1ESR2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220066319-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-03 US disclosed
US-10777850-B2 Nonaqueous electrolytic solution and nonaqueous electrolyte secondary battery using the same MITSUBISHI CHEMICAL CORPORATION (JP) 2020-09-15 US disclosed
US-20190051941-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY USING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2019-02-14 US disclosed
US-10177414-B2 Nonaqueous electrolytic solution and nonaqueous electrolyte secondary battery using the same MITSUBISHI CHEMICAL CORPORATION (JP) 2019-01-08 US disclosed
US-20160322669-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY USING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2016-11-03 US disclosed
US-9461334-B2 Nonaqueous electrolytic solution and nonaqueous electrolyte battery using the same MITSUBISHI CHEMICAL CORPORATION (JP) 2016-10-04 US disclosed
US-20160211553-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY USING SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2016-07-21 US disclosed