Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 6/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 3/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | MMP9 | P14780 | 1/20 | 0.36 |
| ▸ | MMP8 | P22894 | 1/20 | 0.36 |
| ▸ | MMP14 | P50281 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.35 |
| ▸ | HTR1A | P08908 | 1/20 | 0.35 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.35 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28943130 | 0.92 | CYP3A4 (0.44) | CYP3A4ALDH1A1TDP1L3MBTL1TSHR | |
| Formic Acid SCHEMBL11703007 | 0.89 | TSHR (0.47) | CYP3A4ALDH1A1TDP1L3MBTL1TSHR | |
| SCHEMBL9766723 | 0.86 | CYP3A4 (0.47) | CYP3A4ALDH1A1TDP1L3MBTL1TSHR | |
| SCHEMBL10533559 | 0.86 | CYP3A4 (0.47) | CYP3A4ALDH1A1TDP1L3MBTL1TSHR | |
| SCHEMBL9438205 | 0.86 | LMNA (0.43) | CYP3A4ALDH1A1TDP1L3MBTL1LMNA | |
| SCHEMBL5161833 | 0.86 | LMNA (0.43) | CYP3A4ALDH1A1TDP1L3MBTL1LMNA | |
| SCHEMBL9438365 | 0.86 | LMNA (0.43) | CYP3A4ALDH1A1TDP1L3MBTL1LMNA | |
| SCHEMBL28943056 | 0.84 | OPRM1 (0.40) | CYP3A4ALDH1A1TDP1L3MBTL1TSHR | |
| SCHEMBL17780067 | 0.83 | CYP3A4 (0.52) | CYP3A4ALDH1A1TDP1L3MBTL1TSHR | |
| SCHEMBL8217857 | 0.80 | CYP3A4 (0.55) | CYP3A4ALDH1A1TDP1L3MBTL1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 625 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114008731-B | Method for producing magnet powder and sintered magnet produced thereby | 株式会社LG化学 | 2024-06-14 | — | — | CN | claimed |
| CN-114276814-B | Cleaning solution after etching silicon wafer | 湖北兴福电子材料股份有限公司 | 2023-05-12 | — | — | CN | claimed |
| CN-114276814-A | Cleaning fluid for silicon wafer etching | 湖北兴福电子材料有限公司 | 2022-04-05 | — | — | CN | claimed |
| CN-114008731-A | Method for producing magnet powder and sintered magnet produced by the same | 株式会社LG化学 | 2022-02-01 | — | — | CN | claimed |
| CN-106573304-B | Silver powder and method for producing same | 同和电子科技有限公司 | 2020-03-03 | — | — | CN | claimed |
| US-10170213-B2 | Silver powder and method for producing same | DOWA ELECTRONICS MATERIALS CO., LTD. (JP) | 2019-01-01 | — | — | US | claimed |
| US-20180158564-A1 | SILVER POWDER AND METHOD FOR PRODUCING SAME | DOWA ELECTRONICS MATERIALS CO., LTD. (JP) | 2018-06-07 | — | — | US | claimed |
| US-9984788-B2 | Silver powder and method for producing same | DOWA ELECTRONICS MATERIALS CO., LTD. (JP) | 2018-05-29 | — | — | US | claimed |
| US-20170206998-A1 | SILVER POWDER AND METHOD FOR PRODUCING SAME | DOWA ELECTRONICS MATERIALS CO., LTD. (JP) | 2017-07-20 | — | — | US | claimed |
| WO-2016066613-A1 | POLYMER COMPRISING ALKOXYSILANE GROUPS AND USE IN COSMETICS | L'OREAL (FR) | 2016-05-06 | — | — | WO | claimed |
| EP-0810203-A1 | Polyamines containing ester- and amido groups, a process for their preparation and their use | HÜLS AKTIENGESELLSCHAFT (DE) | 1997-12-03 | — | — | EP | claimed |
| EP-0785981-A1 | LAUNDRY DETERGENT COMPOSITIONS CONTAINING LIPOLYTIC ENZYME AND AMINES | THE PROCTER & GAMBLE COMPANY (US) | 1997-07-30 | — | — | EP | claimed |
| WO-1996012004-A1 | LAUNDRY DETERGENT COMPOSITIONS CONTAINING LIPOLYTIC ENZYME AND AMINES | THE PROCTER & GAMBLE COMPANY (US) | 1996-04-25 | — | — | WO | claimed |
| EP-0400657-B1 | Process for developing of ps plates requiring no dampening water | FUJI PHOTO FILM CO LTD (JP) | 1996-03-27 | — | — | EP | claimed |
| US-5290665-A | Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative | FUJI PHOTO FILM CO., LTD. (JP) | 1994-03-01 | — | — | US | claimed |
| US-5252431-A | Light sensitive layer and silicone rubber layer; spraying pressurized liquid on the surface to remove the rubber layer | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-12 | — | — | US | claimed |
| US-5230989-A | Presensitized plate | FUJI PHOTO FILM CO., LTD. (JP) | 1993-07-27 | — | — | US | claimed |
| EP-0475384-A1 | Spray development process | Fuji Photo Film Co., Ltd. (JP) | 1992-03-18 | — | — | EP | claimed |
| EP-0400657-A2 | Process for developing of ps plates requiring no dampening water | Fuji Photo Film Co., Ltd. (JP) | 1990-12-05 | — | — | EP | claimed |
| EP-0194885-B1 | AZO COMPOUND AND AQUEOUS INK COMPOSITION COMPRISING THE SAME | TAOKA CHEMICAL CO., LTD (JP) | 1989-06-07 | — | — | EP | claimed |