SCHEMBL17995302

SCHEMBL17995302

CNC(C(=O)O)C1CCc2ccccc2C1

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 4/20 0.48
MTNR1B P49286 4/20 0.48
GRM7 Q14831 2/20 0.39
NPY5R Q15761 1/20 0.39
PLAU P00749 1/20 0.39
GRIN2B Q13224 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
GHSR Q92847 1/20 0.38
ANPEP P15144 1/20 0.37
MAOA P21397 1/20 0.37
MAOB P27338 1/20 0.37
KDM4E B2RXH2 1/20 0.37
MEN1 O00255 1/20 0.37
GMNN O75496 1/20 0.37
LMNA P02545 1/20 0.37
PMP22 Q01453 1/20 0.37
KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12966499 0.89 GRM7 (0.44) MTNR1AMTNR1BGRM7NPY5RLMNA
SCHEMBL805196 0.89 GRM7 (0.44) MTNR1AMTNR1BGRM7NPY5RLMNA
SCHEMBL6956584 0.82 MTNR1A (0.42) MTNR1AMTNR1BGRM7NPY5RPLAU
SCHEMBL2480890 0.80 MTNR1A (0.47) MTNR1AMTNR1BGRM7NPY5RPLAU
SCHEMBL11472821 0.78 MTNR1A (0.45) MTNR1AMTNR1BPLAUGRIN2BCA1
SCHEMBL3611898 0.76 PLAU (0.46) MTNR1AMTNR1BPLAUCA1CA2
SCHEMBL7301985 0.76 MTNR1A (0.44) MTNR1AMTNR1BGRM7NPY5RPLAU
SCHEMBL26654656 0.76 MTNR1A (0.44) MTNR1AMTNR1BGRM7NPY5RPLAU
SCHEMBL10442380 0.76 MTNR1A (0.42) MTNR1AMTNR1BGRM7MEN1LMNA
SCHEMBL10442065 0.76 MTNR1A (0.42) MTNR1AMTNR1BGRM7MEN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170097567-A1 METHOD FOR PRODUCING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-06 US disclosed
US-20160229940-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed