SCHEMBL18012642

SCHEMBL18012642

CCC1(CC)c2cc(/C(C)=N/OC(C)=O)ccc2-c2ccc(/C(C)=N/OC(C)=O)cc21

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 1/20 0.39
▸ PDE4B Q07343 1/20 0.36
▸ PDE4D Q08499 1/20 0.36
▸ MAPK14 Q16539 1/20 0.36
▸ PDK2 Q15119 8/20 0.36
▸ PKM P14618 2/20 0.36
▸ MAPT P10636 2/20 0.35
▸ NPY1R P25929 1/20 0.35
▸ NPY2R P49146 1/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ MEN1 O00255 1/20 0.34
▸ POLB P06746 1/20 0.34
▸ KMT2A Q03164 1/20 0.34
▸ CDK5 Q00535 1/20 0.34
▸ CDK5R1 Q15078 1/20 0.34
▸ KCNH2 Q12809 1/20 0.33
▸ HTR7 P34969 1/20 0.32
▸ HTR2B P41595 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18012774 0.94 RAB9A (0.35) RAB9APDE4BPDE4DMAPK14PDK2
SCHEMBL17877624 0.92 KMT2A (0.40) RAB9APDE4BPDE4DMAPK14PDK2
SCHEMBL17877625 0.91 HPGD (0.39) RAB9APDE4BPDE4DMAPK14PDK2
SCHEMBL17953240 0.90 PDK2 (0.45) PDK2PKMMAPTCYP1A2CDK5
SCHEMBL18673351 0.89 ALK (0.36) RAB9APDE4BPDE4DMAPK14PDK2
SCHEMBL18012817 0.87 PDK2 (0.36) RAB9APDE4BPDE4DMAPK14PDK2
SCHEMBL18012785 0.86 PPARG (0.36) PKMMAPTMEN1POLBKMT2A
SCHEMBL18012776 0.86 PKM (0.40) RAB9APDK2PKMMAPTMEN1
SCHEMBL18012814 0.86 MAPT (0.38) RAB9APDK2PKMMAPTPOLB
SCHEMBL18012710 0.85 MAPT (0.53) RAB9APKMMAPTNPY1RNPY2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2016126070-A1 NOVEL OXIMESTER DERIVATIVE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING SAME 한국화학연구원 2016-08-11 — — WO disclosed
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