SCHEMBL18014646

SCHEMBL18014646

CCO[Si](C)(COC(=O)C(C)(C)CC)OCC

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.36
CYP4A11 Q02928 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18014645 0.85 CYP4F2 (0.36) CYP4F2CYP4A11
SCHEMBL28860692 0.85 PRKCA (0.35) CYP4F2CYP4A11
SCHEMBL18014639 0.85 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL15726743 0.83 CYP4F2 (0.37) CYP4F2CYP4A11
SCHEMBL108249 0.80 CYP4F2 (0.36) CYP4F2CYP4A11
SCHEMBL18014650 0.80 CYP4F2 (0.36) CYP4F2CYP4A11
SCHEMBL12130504 0.80 CYP4F2 (0.36) CYP4F2CYP4A11
SCHEMBL18014655 0.79 CYP4F2 (0.35) CYP4F2CYP4A11
Propene SCHEMBL28106961 0.77 PRKCA (0.31) CYP4F2CYP4A11
SCHEMBL18014652 0.76 CYP4F2 (0.36) CYP4F2CYP4A11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9971245-B2 Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-15 US disclosed
US-20160229939-A1 SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed