Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 8/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18014656 | 0.89 | CHRM2 (0.33) | CHRM2CHRM4CHRM1CHRM3ACHE | |
| SCHEMBL14092772 | 0.87 | CHRM2 (0.34) | CHRM2CHRM4CHRM1CHRM3ACHE | |
| SCHEMBL12018806 | 0.87 | ACHE (0.33) | ACHEALDH1A1 | |
| SCHEMBL12972542 | 0.82 | CHRM2 (0.32) | CHRM2CHRM4CHRM1CHRM3ALDH1A1 | |
| SCHEMBL15356147 | 0.82 | ACHE (0.32) | ACHEALDH1A1 | |
| SCHEMBL12716965 | 0.82 | ACHE (0.32) | ACHEALDH1A1 | |
| SCHEMBL18014649 | 0.81 | CHRM2 (0.31) | CHRM2CHRM4CHRM1CHRM3ACHE | |
| SCHEMBL12130528 | 0.81 | ACHE (0.31) | ACHE | |
| SCHEMBL15293571 | 0.81 | ATM (0.32) | ACHEATM | |
| SCHEMBL15293575 | 0.81 | ATM (0.32) | ACHEATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20160229939-A1 | SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |