SCHEMBL12130528

SCHEMBL12130528

CCO[Si](C)(CCCOC(=O)C(C)CC)OCC

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18014649 0.87 CHRM2 (0.31) ACHE
SCHEMBL12130527 0.86 ACHE (0.30) ACHE
SCHEMBL12716965 0.85 ACHE (0.32) ACHE
SCHEMBL8839289 0.85 ALDH1A1 (0.31)
SCHEMBL12018806 0.82 ACHE (0.33) ACHE
SCHEMBL18014659 0.81 CHRM2 (0.33) ACHE
SCHEMBL18014656 0.81 CHRM2 (0.33) ACHE
SCHEMBL692978 0.80 ALDH1A1 (0.41) ACHE
SCHEMBL15894235 0.80 ACHE (0.30) ACHE
SCHEMBL17612292 0.79 ACHE (0.33) ACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9971245-B2 Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-15 US disclosed
US-20160229939-A1 SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed
US-8063162-B2 Polymer for an ink receiving layer of an inkjet recording element HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2011-11-22 US disclosed
US-20110160416-A1 POLYMER FOR AN INK RECEIVING LAYER OF AN INKJET RECORDING ELEMENT CHEN TIENTEH 2011-06-30 US disclosed