SCHEMBL18014649

SCHEMBL18014649

CCO[Si](C)(C)CCCOC(=O)C(C)CC

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRM3 P20309 1/20 0.31
ACHE P22303 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12130528 0.87 ACHE (0.31) ACHE
SCHEMBL25276752 0.86 ALDH1A1 (0.31) CHRM2CHRM4CHRM1CHRM3ACHE
SCHEMBL8839289 0.85 ALDH1A1 (0.31)
SCHEMBL15356147 0.85 ACHE (0.32) ACHE
SCHEMBL15293571 0.83 ATM (0.32) ACHE
SCHEMBL12018806 0.82 ACHE (0.33) ACHE
SCHEMBL13129217 0.82 ALDH1A1 (0.36) ACHE
SCHEMBL18014656 0.81 CHRM2 (0.33) CHRM2CHRM4CHRM1CHRM3ACHE
SCHEMBL18014659 0.81 CHRM2 (0.33) CHRM2CHRM4CHRM1CHRM3ACHE
SCHEMBL15293573 0.80 ALDH1A1 (0.34) ACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9971245-B2 Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-15 US disclosed
US-20160229939-A1 SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed