SCHEMBL18071769

SCHEMBL18071769

CCCCOC(=O)OCC#Cc1ccc2c3c(cccc13)C(=O)N(OS(=O)(=O)C(F)(F)F)C2=O

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 3/20 0.38
▸ MEN1 O00255 3/20 0.38
▸ MAPT P10636 3/20 0.38
▸ KMT2A Q03164 3/20 0.38
▸ POLB P06746 2/20 0.38
▸ L3MBTL1 Q9Y468 2/20 0.38
▸ TDP1 Q9NUW8 2/20 0.36
▸ ALDH1A1 P00352 2/20 0.31
▸ PTGDR2 Q9Y5Y4 1/20 0.31
▸ HTT P42858 2/20 0.31
▸ RGS12 O14924 1/20 0.31
▸ USP2 O75604 1/20 0.31
▸ MAPK1 P28482 1/20 0.31
▸ ATM Q13315 1/20 0.31
▸ NPSR1 Q6W5P4 1/20 0.31
▸ TLR9 Q9NR96 1/20 0.31
▸ KDM4E B2RXH2 1/20 0.30
▸ HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18069210 0.90 ELANE (0.40) ELANEMEN1MAPTKMT2APOLB
SCHEMBL18069157 0.89 MAPT (0.38) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL18069167 0.89 TDP1 (0.39) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL18069151 0.88 MAPT (0.38) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL18069152 0.88 MAPT (0.40) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL18069171 0.87 POLB (0.37) ELANEMEN1MAPTKMT2APOLB
SCHEMBL18069159 0.87 MAPT (0.39) ELANEMEN1MAPTKMT2APOLB
SCHEMBL18069176 0.87 KMT2A (0.41) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL18069162 0.86 MEN1 (0.37) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL19014797 0.85 TDP1 (0.37) ELANEMEN1MAPTKMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220026801-A1 CHEMICALLY AMPLIFIED POSITIVE -TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD (JP) 2022-01-27 — — US disclosed
US-20200209748-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2020-07-02 — — US disclosed
US-9709886-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2017-07-18 — — US disclosed
US-9709886-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2017-07-18 — — US disclosed
EP-3182203-A1 A COMBINATION OF NIT DERIVATIVES WITH SENSITIZERS Heraeus Precious Metals North America Daychem LLC (US) 2017-06-21 — — EP disclosed
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2017-01-05 — — US disclosed
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2017-01-05 — — US disclosed
US-9477150-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2016-10-25 — — US disclosed
US-9477150-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2016-10-25 — — US disclosed
WO-2016148809-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS Heraeus Precious Metals North America Daychem LLC (US) 2016-09-22 — — WO disclosed
US-20160266487-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2016-09-15 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160266487-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS ALAD, MPST, ASIC1 ELANE 3594/4885MEN1 1317/4885MAPT 3437/4885
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS ALAD, MPST, ASIC1 ELANE 3594/4885MEN1 1317/4885MAPT 3437/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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