SCHEMBL180909

SCHEMBL180909

O=C(O)C(C(=O)O)C(C(=O)O)P(=O)(O)O

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 12/20 0.36
MEN1 O00255 1/20 0.35
LMNA P02545 1/20 0.35
HPGD P15428 1/20 0.35
TSHR P16473 1/20 0.35
BLM P54132 1/20 0.35
KMT2A Q03164 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
GRIN2D O15399 1/20 0.34
GRIN3B O60391 1/20 0.34
GRIN1 Q05586 1/20 0.34
GRIN2A Q12879 1/20 0.34
GRIN2B Q13224 1/20 0.34
GRIN2C Q14957 1/20 0.34
GRIN3A Q8TCU5 1/20 0.34
NAALAD2 Q9Y3Q0 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4093592 0.84 FOLH1 (0.40) FOLH1MEN1LMNAHPGDTSHR
Water SCHEMBL11413207 0.81 FOLH1 (0.39) FOLH1MEN1LMNAHPGDTSHR
SCHEMBL9115400 0.74 TP53 (0.38) FOLH1MEN1LMNAHPGDTSHR
SCHEMBL27645362 0.74 FOLH1 (0.34) FOLH1MEN1LMNAHPGDTSHR
SCHEMBL27744581 0.72 SLC7A5 (0.42) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL10442157 0.72 TP53 (0.43) FOLH1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL7521763 0.72 TP53 (0.36) FOLH1MEN1LMNAHPGDTSHR
SCHEMBL8843628 0.72 SLC7A5 (0.42) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL11338645 0.70 TP53 (0.35) FOLH1MEN1LMNAHPGDTSHR
SCHEMBL9114720 0.70 LAP3 (0.39) FOLH1MEN1LMNAHPGDTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2762977-B1 METHOD FOR RECYCLING PLATE-MAKING PROCESSING WASTE SOLUTION FUJIFILM CORP (JP) 2017-09-27 EP disclosed
EP-2757417-B1 METHOD FOR RECYCLING WASTEWATER PRODUCED BY PLATE-MAKING PROCESS FUJIFILM CORP (JP) 2016-05-25 EP disclosed
EP-1176467-B1 Negative working photosensitive lithographic printing plate FUJIFILM CORP (JP) 2015-09-16 EP disclosed
EP-2869122-A1 METHOD FOR CONCENTRATING PROCESSING WASTE LIQUID AND METHOD FOR RECYCLING PROCESSING WASTE LIQUID Fujifilm Corporation (JP) 2015-05-06 EP disclosed
US-20150104746-A1 METHOD OF CONCENTRATING WASTE LIQUID PRODUCED BY DEVELOPMENT, AND METHOD OF RECYCLING WASTE LIQUID PRODUCED BY DEVELOPMENT FUJIFILM CORPORATION (JP) 2015-04-16 US disclosed
US-20150093879-A1 TEMPORARY ADHESIVE FOR PRODUCTION OF SEMICONDUCTOR DEVICE, AND ADHESIVE SUPPORT AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2015-04-02 US disclosed
CN-104395834-A Method for concentrating processing waste liquid and method for recycling processing waste liquid FUJIFILM CORP 2015-03-04 CN disclosed
US-20140234778-A1 METHOD FOR RECYCLING PLATE-MAKING PROCESSING WASTE SOLUTION FUJIFILM CORPORATION (JP) 2014-08-21 US disclosed
EP-2762977-A1 METHOD FOR RECYCLING PLATE-MAKING PROCESSING WASTE SOLUTION FUJIFILM Corporation (JP) 2014-08-06 EP disclosed
EP-2757417-A1 METHOD FOR RECYCLING WASTEWATER PRODUCED BY PLATE-MAKING PROCESS FUJIFILM Corporation (JP) 2014-07-23 EP disclosed
US-5741619-A Negative image-recording material comprising an acrylic resin, a diazo compound and carbon black FUJI PHOTO FILM CO., LTD. (JP) 1998-04-21 US disclosed
EP-0547578-B1 Light-sensitive composition FUJI PHOTO FILM CO LTD (JP) 1998-03-18 EP disclosed
EP-0674224-A1 Photosensitive composition and image formation using the same FUJI PHOTO FILM CO., LTD. (JP) 1995-09-27 EP disclosed
US-5424165-A Printing durability, storage stability FUJI PHOTO FILM CO., LTD. (JP) 1995-06-13 US disclosed
US-5340685-A Light-sensitive composition containing diazo resin, polyurethane resin and fluorine atom-containing copolymer surfactant FUJI PHOTO FILM CO., LTD. (JP) 1994-08-23 US disclosed
EP-0563990-A1 Light-sensitive composition Fuji Photo Film Co., Ltd. (JP) 1993-10-06 EP disclosed
EP-0547578-A1 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1993-06-23 EP disclosed
EP-0130488-B1 PRESENSITIZED LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJI PHOTO FILM CO., LTD. (JP) 1990-03-14 EP disclosed
US-4576893-A DIAZO RESIN, PYRIDINEDICARBOXYLIC ACID FUJI PHOTO FILM CO., LTD. (JP) 1986-03-18 US disclosed
EP-0130488-A2 Presensitized lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1985-01-09 EP disclosed