SCHEMBL18119985

SCHEMBL18119985

C=C(C)C(=O)CCCO[Si](C)(C)C(C)(C)C

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
DUT P33316 2/20 0.35
TSHR P16473 2/20 0.33
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL875754 0.82 DUT (0.39) DUT
SCHEMBL23532365 0.82 DUT (0.36) DUT
SCHEMBL17211882 0.79 TSHR (0.51) DUTTSHRTHRB
Lithium Ion SCHEMBL15778648 0.79 CA1 (0.38) DUT
SCHEMBL4590603 0.78 ALDH1A1 (0.41) DUTTSHR
SCHEMBL28516260 0.78 DUT (0.39) DUT
SCHEMBL27507727 0.77 ALDH1A1 (0.30) TSHR
SCHEMBL3217922 0.77 DUT (0.38) DUT
SCHEMBL5536890 0.77 ALDH1A1 (0.40) DUTTSHR
SCHEMBL14059474 0.77 DUT (0.35) DUT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160291461-A1 PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, BLOCK COPOLYMER AND BLOCK COPOLYMER PRODUCTION METHOD FUJIFILM CORPORATION (JP) 2016-10-06 US disclosed
US-20160291461-A1 PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, BLOCK COPOLYMER AND BLOCK COPOLYMER PRODUCTION METHOD FUJIFILM CORPORATION (JP) 2016-10-06 US disclosed