⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL8118406 | 0.95 | — | — | |
| SCHEMBL232317 | 0.94 | — | — | |
| Fluoride SCHEMBL28075991 | 0.91 | — | — | |
| Iodide SCHEMBL196407 | 0.89 | — | — | |
| Water SCHEMBL28331162 | 0.89 | NFKB1 (0.42) | — | |
| Bromide SCHEMBL3209609 | 0.89 | — | — | |
| Bromide SCHEMBL3209595 | 0.89 | NFKB1 (0.42) | — | |
| Hydrochloric Acid SCHEMBL370134 | 0.89 | — | — | |
| Water SCHEMBL187547 | 0.89 | — | — | |
| SCHEMBL7553746 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120118223-A | Method for adjusting particle size of fluorine-containing polymer emulsion | 浙江蓝天环保高科技股份有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-120118250-A | Surfactant, preparation method and application thereof | 浙江蓝天环保高科技股份有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-120118232-A | Preparation method and application of fluorine-containing polymer emulsion | 浙江蓝天环保高科技股份有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-118056812-A | Continuous preparation method of perfluoroisobutyronitrile | 浙江省化工研究院有限公司 | 2024-05-21 | — | — | CN | claimed |
| CN-118056807-A | Method for continuously preparing perfluorinated acyl fluoride compounds | 浙江省化工研究院有限公司 | 2024-05-21 | — | — | CN | claimed |
| CN-112480928-A | Silicon etching composition and etching method for silicon substrate by using same | 利绅科技股份有限公司 | 2021-03-12 | — | — | CN | claimed |
| CN-105733587-B | Etchant solution and method of use thereof | 弗萨姆材料美国有限责任公司 | 2020-04-03 | — | — | CN | claimed |
| US-9873833-B2 | Etchant solutions and method of use thereof | VERSUM MATERIALS US, LLC (US) | 2018-01-23 | — | — | US | claimed |
| EP-3040397-A1 | ETCHANT SOLUTIONS AND METHOD OF USE THEREOF | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-07-06 | — | — | EP | claimed |
| US-20160186058-A1 | Etchant Solutions and Method of Use Thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-06-30 | — | — | US | claimed |
| US-7947637-B2 | Cleaning formulation for removing residues on surfaces | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2011-05-24 | — | — | US | claimed |
| EP-2041776-A2 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FujiFilm Electronic Materials USA, Inc. (US) | 2009-04-01 | — | — | EP | claimed |
| WO-2008005354-A2 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-01-10 | — | — | WO | claimed |
| US-20080004197-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2008-01-03 | — | — | US | claimed |
| US-20260071095-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2026-03-12 | — | — | US | disclosed |
| US-20250320381-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250282977-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-09-11 | — | — | US | disclosed |
| US-6197733-B1 | USED AFTER ASHING OF PHOTORESIST IN PRODUCTION OF SEMICONDUCTOR CIRCUIT PATTERN | TOKUYAMA CORPORATION (JP) | 2001-03-06 | — | — | US | disclosed |
| US-5516878-A | CATALYTIC ESTER INTERCHANGE USING AN ALKALI METAL SALT OF AN ATE-COMPLEX OF A METAL SELECTED FROM SILICON, GERMANIUM, TIN, OR LEAD | TEIJIN LIMITED (JP) | 1996-05-14 | — | — | US | disclosed |
| EP-0667366-A2 | Process for the production of aromatic polycarbonate | TEIJIN LIMITED (JP) | 1995-08-16 | — | — | EP | disclosed |