Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 3/20 | 0.69 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.69 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.69 |
| ▸ | HNF4A | P41235 | 2/20 | 0.62 |
| ▸ | PTGS2 | P35354 | 4/20 | 0.61 |
| ▸ | LCK | P06239 | 1/20 | 0.56 |
| ▸ | CA1 | P00915 | 2/20 | 0.55 |
| ▸ | CA2 | P00918 | 2/20 | 0.55 |
| ▸ | CA12 | O43570 | 1/20 | 0.55 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.55 |
| ▸ | CA7 | P43166 | 1/20 | 0.55 |
| ▸ | CA9 | Q16790 | 1/20 | 0.55 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.55 |
| ▸ | APP | P05067 | 5/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | HPGD | P15428 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.54 |
| ▸ | MEN1 | O00255 | 2/20 | 0.52 |
| ▸ | KDR | P35968 | 2/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30646335 | 1.00 | PTPN1 (0.69) | PTPN1PTPN2PTPN6HNF4APTGS2 | |
| SCHEMBL1813719 | 0.84 | PTPN1 (0.62) | PTPN1PTPN2PTPN6HNF4APTGS2 | |
| SCHEMBL220169 | 0.83 | MCL1 (0.51) | PTPN1PTPN2PTPN6HNF4APTGS2 | |
| SCHEMBL685913 | 0.82 | TRPA1 (0.50) | PTPN1PTPN2PTPN6HNF4APTGS2 | |
| SCHEMBL6266629 | 0.82 | PTPN1 (1.00) | PTPN1PTPN2PTPN6HNF4APTGS2 | |
| SCHEMBL130917 | 0.82 | PTPN1 (0.71) | PTPN1PTPN2PTPN6HNF4APTGS2 | |
| SCHEMBL6266631 | 0.82 | PTPN1 (1.00) | PTPN1PTPN2PTPN6HNF4APTGS2 | |
| SCHEMBL29354644 | 0.82 | PTPN1 (0.71) | PTPN1PTPN2PTPN6HNF4APTGS2 | |
| SCHEMBL1048686 | 0.82 | PTPN1 (1.00) | PTPN1PTPN2PTPN6HNF4APTGS2 | |
| SCHEMBL29938670 | 0.82 | PTPN1 (1.00) | PTPN1PTPN2PTPN6HNF4APTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-63270060-A | — | — | None | — | — | JP | disclosed |
| US-20250208531-A1 | TONER | CANON KABUSHIKI KAISHA (JP) | 2025-06-26 | — | — | US | disclosed |
| US-20250162979-A1 | P-DIPHENYL COMPOUND DERIVATIVE MIXTURE AND METHOD OF PRODUCING THE SAME | HODOGAYA CHEMICAL CO., LTD. (JP) | 2025-05-22 | — | — | US | disclosed |
| US-20250130492-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-04-24 | — | — | US | disclosed |
| US-20250102913-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-03-27 | — | — | US | disclosed |
| US-20240411226-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-12-12 | — | — | US | disclosed |
| WO-2024190386-A1 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | JSR株式会社 | 2024-09-19 | — | — | WO | disclosed |
| CN-114702533-B | Benzoate monomer containing ferrocene unit and preparation method thereof | 金发科技股份有限公司 | 2024-03-22 | — | — | CN | disclosed |
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-5362600-A | Radiation sensitive compositions comprising polymer having acid labile groups | SHIPLEY COMPANY INC. (US) | 1994-11-08 | — | — | US | disclosed |
| EP-0613468-A1 | NOVEL SUBSTITUTED SALICYCLIC ACIDS | Pharmacia & Upjohn Aktiebolag (SE) | 1994-09-07 | — | — | EP | disclosed |
| WO-1993010094-A1 | NOVEL SUBSTITUTED SALICYCLIC ACIDS | KABI PHARMACIA AB (SE) | 1993-05-27 | — | — | WO | disclosed |
| US-5008237-A | High gloss images | THE MEAD CORPORATION (US) | 1991-04-16 | — | — | US | disclosed |
| CN-1038355-A | DEVELOPER COMPOSITION | MEAD CORP (US) | 1989-12-27 | — | — | CN | disclosed |
| US-4877767-A | PHOTOGRAPHIC QUALITY IMAGES; HIGH GLOSS, NONYELLOWING | THE MEAD CORPORATION (US) | 1989-10-31 | — | — | US | disclosed |
| EP-0327409-A2 | Developer composition | THE MEAD CORPORATION (US) | 1989-08-09 | — | — | EP | disclosed |
| US-4853364-A | Developer composition comprising phenol resins and vinylic or acrylic resins | THE MEAD CORPORATION (US) | 1989-08-01 | — | — | US | disclosed |
| EP-0303509-A2 | Developer sheet | THE MEAD CORPORATION (US) | 1989-02-15 | — | — | EP | disclosed |
| JP-S63270060-A | ANTIBACTERIAL ADHESIVE MEMBER | NITTO ELECTRIC IND CO LTD | 1988-11-08 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250162979-A1 | P-DIPHENYL COMPOUND DERIVATIVE MIXTURE AND METHOD OF PRODUCING THE SAME | DDT, CYP2D6, CYP3A4 | PTPN1 2299/4885PTPN2 1911/4885PTPN6 1616/4885 |
| US-20250130492-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | RER1, SLC11A2, ABCC1 | PTPN1 3139/4885PTPN2 3670/4885PTPN6 3884/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.