Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRR1 | P24046 | 5/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | GABRR2 | P28476 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.36 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.36 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.36 |
| ▸ | ACE | P12821 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | PMP22 | Q01453 | 2/20 | 0.35 |
| ▸ | APLNR | P35414 | 1/20 | 0.35 |
| ▸ | GABRP | O00591 | 1/20 | 0.35 |
| ▸ | GABRD | O14764 | 1/20 | 0.35 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.35 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.35 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23394808 | 1.00 | GABRR1 (0.50) | GABRR1CYP2C19POLBTDP1GABRR2 | |
| SCHEMBL17049779 | 0.93 | GABRR1 (0.44) | GABRR1CYP2C19POLBTDP1GABRR2 | |
| SCHEMBL1963027 | 0.85 | GABRR1 (0.58) | GABRR1CYP2C19GABRR2CYP1A2CYP2D6 | |
| SCHEMBL6864216 | 0.85 | GABRR1 (0.50) | GABRR1CYP2C19POLBTDP1GABRR2 | |
| SCHEMBL3237860 | 0.84 | GABRR1 (0.41) | GABRR1CYP2C19POLBTDP1GABRR2 | |
| Hydrochloric Acid SCHEMBL2384923 | 0.82 | GABRR1 (0.48) | GABRR1CYP2C19POLBTDP1GABRR2 | |
| Hydrochloric Acid SCHEMBL3795818 | 0.82 | GABRR1 (0.55) | GABRR1CYP2C19GABRR2CYP1A2CYP2D6 | |
| Hydrochloric Acid SCHEMBL2885177 | 0.82 | GABRR1 (0.48) | GABRR1CYP2C19POLBTDP1GABRR2 | |
| SCHEMBL2697233 | 0.79 | GABRR1 (0.50) | GABRR1CYP2C19POLBTDP1GABRR2 | |
| SCHEMBL9782991 | 0.79 | GABRR1 (0.50) | GABRR1CYP2C19POLBTDP1GABRR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114044913-A | Metal-organic framework material and preparation method thereof | 广东美的白色家电技术创新中心有限公司 | 2022-02-15 | — | — | CN | claimed |
| US-7939242-B2 | barrier film material includes, in addition to an alkali-soluble polymer, a multivalent carboxylic acid compound having a plurality of carboxyl groups or a multivalent alcohol compound. The multivalent carboxylic acid compound or the multivalent alcohol compound is adhered onto the surface of a resist | PANASONIC CORPORATION (JP) | 2011-05-10 | — | — | US | claimed |
| US-20080233491-A1 | BARRIER FILM MATERIAL AND PATTERN FORMATION METHOD USING THE SAME | RPX CORPORATION | 2008-09-25 | — | — | US | claimed |
| US-6927012-B2 | Polyamic acid resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-08-09 | — | — | US | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| EP-3699232-B1 | RESIN COMPOSITION AND MOLDED ARTICLE | MITSUBISHI CHEM CORP (JP) | 2024-04-03 | — | — | EP | disclosed |
| CN-111108151-B | Resin composition and molded article | 三菱工程塑料株式会社 | 2023-06-09 | — | — | CN | disclosed |
| CN-111108152-B | Resin composition and molded article | 三菱工程塑料株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-110554537-B | Varnish for photo-alignment film and liquid crystal display device | 株式会社日本显示器 | 2022-05-10 | — | — | CN | disclosed |
| CN-111690321-B | Varnish for photo-alignment film and liquid crystal display device | 株式会社日本显示器 | 2022-02-08 | — | — | CN | disclosed |
| CN-111690321-A | Varnish for photo-alignment film and liquid crystal display device | 株式会社日本显示器 | 2020-09-22 | — | — | CN | disclosed |
| EP-3699233-A1 | RESIN COMPOSITION AND MOLDED ARTICLE | Mitsubishi Engineering-Plastics Corporation (JP) | 2020-08-26 | — | — | EP | disclosed |
| EP-0313474-A2 | An optical article exhibiting a high level of second order polarization susceptibility | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1989-04-26 | — | — | EP | disclosed |
| EP-0313475-A2 | An optical article containing a transmission medium exhibiting a high level of second order polarization susceptibility | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1989-04-26 | — | — | EP | disclosed |
| EP-0313476-A2 | An optical article containing a polymeric matrix exhibiting a high level of second order polarization susceptibility | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1989-04-26 | — | — | EP | disclosed |
| US-4796971-A | CHARGE TRANSFER COMPOUND ON CROSSLINKED MATRIX | EASTMAN KODAK COMPANY (US) | 1989-01-10 | — | — | US | disclosed |
| US-4792208-A | POLAR ALIGNED NONCENTROSYMMETRIC MOLECULAR DIPOLES; SULFONYL MOIETY AS ELECTRON ACCEPTOR | EASTMAN KODAK COMPANY (US) | 1988-12-20 | — | — | US | disclosed |
| EP-0129234-B1 | ELECTROPHOTOGRAPHIC ELEMENTS HAVING BARRIER LAYERS OF CROSSLINKED POLYMERS | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1987-11-04 | — | — | EP | disclosed |
| EP-0129234-A1 | Electrophotographic elements having barrier layers of crosslinked polymers | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1984-12-27 | — | — | EP | disclosed |
| US-4485161-A | Electrophotographic elements having barrier layers of crosslinked polymers of aliphatic or aromatic monomers containing α,β-ethylenically unsaturated carbonyl-containing substituents | EASTMAN KODAK COMPANY (US) | 1984-11-27 | — | — | US | disclosed |