SCHEMBL18179356

SCHEMBL18179356

N#Cc1c(Oc2ccc(C=O)cc2)cccc1Oc1ccc2cc(C3(c4ccc5cc(Oc6cccc(Oc7ccc(C=O)cc7)c6C#N)ccc5c4)c4ccccc4-c4ccccc43)ccc2c1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.33
RCE1 Q9Y256 1/20 0.33
MAPT P10636 2/20 0.32
KDM4E B2RXH2 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
RAB9A P51151 2/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
NPC1 O15118 1/20 0.32
TTR P02766 1/20 0.32
ALDH1A1 P00352 2/20 0.32
ESR1 P03372 1/20 0.31
ESR2 Q92731 1/20 0.31
HSD11B1 P28845 1/20 0.31
STK10 O94804 1/20 0.31
SLK Q9H2G2 1/20 0.31
LMNA P02545 1/20 0.30
AR P10275 1/20 0.30
CNR1 P21554 1/20 0.30
GPR183 P32249 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18179355 0.96 GAA (0.33) GAARCE1MAPTKDM4ESMN1; SMN2
SCHEMBL18723325 0.95 ESR1 (0.33) GAARCE1MAPTKDM4ESMN1; SMN2
SCHEMBL18179341 0.91 LMNA (0.36) GAAMAPTKDM4ESMN1; SMN2MEN1
SCHEMBL18179354 0.90 GAA (0.33) GAARCE1MAPTKDM4ESMN1; SMN2
SCHEMBL18179353 0.88 GAA (0.33) GAARCE1KDM4ESMN1; SMN2RAB9A
SCHEMBL18179343 0.84 MAPT (0.35) GAAMAPTKDM4ERAB9AMEN1
SCHEMBL18179358 0.83 PIM1 (0.37) GAARCE1MAPTKDM4ESMN1; SMN2
SCHEMBL18712910 0.83 GAA (0.39) GAARCE1MAPTKDM4ESMN1; SMN2
SCHEMBL18179329 0.82 AR (0.33) GAARCE1MAPTKDM4ESMN1; SMN2
SCHEMBL18179340 0.82 ESR1 (0.34) GAARCE1KDM4ESMN1; SMN2RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9958781-B2 Method for film formation, and pattern-forming method JSR CORPORATION (JP) 2018-05-01 US disclosed
US-9620378-B1 Composition for film formation, film, production method of patterned substrate, and compound JSR CORPORATION (JP) 2017-04-11 US disclosed
US-9620378-B1 Composition for film formation, film, production method of patterned substrate, and compound JSR CORPORATION (JP) 2017-04-11 US disclosed
US-20160314984-A1 METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-10-27 US disclosed
US-20160314984-A1 METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-10-27 US disclosed