Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | EGFR | P00533 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18186751 | 1.00 | SMN1; SMN2 (0.44) | SMN1; SMN2TSHRNPC1MAPTHPGD | |
| SCHEMBL8650664 | 0.86 | NPC1 (0.36) | SMN1; SMN2NPC1MAPTHPGDRAB9A | |
| SCHEMBL8650660 | 0.86 | NPC1 (0.36) | SMN1; SMN2NPC1MAPTHPGDRAB9A | |
| SCHEMBL1078383 | 0.79 | ALDH1A1 (0.35) | SMN1; SMN2NPC1MAPTHPGDRAB9A | |
| SCHEMBL6901403 | 0.78 | TP53 (0.34) | — | |
| SCHEMBL6901400 | 0.78 | TP53 (0.34) | — | |
| SCHEMBL6902310 | 0.77 | TSHR (0.47) | SMN1; SMN2TSHR | |
| SCHEMBL11042953 | 0.77 | NPC1 (0.31) | SMN1; SMN2NPC1MAPTHPGDRAB9A | |
| SCHEMBL11042955 | 0.77 | NPC1 (0.31) | SMN1; SMN2NPC1MAPTHPGDRAB9A | |
| SCHEMBL2783831 | 0.75 | TSHR (0.45) | SMN1; SMN2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3088955-B1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-06-03 | — | — | EP | disclosed |
| US-9921479-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-20 | — | — | US | disclosed |
| US-20160320699-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-03 | — | — | US | disclosed |
| EP-3088955-A2 | RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-11-02 | — | — | EP | disclosed |