SCHEMBL18199035

SCHEMBL18199035

CCC(CC(F)(F)F)OC(=O)C(C)(C)CC

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19998162 0.85 PRKCA (0.34) PRKCA
SCHEMBL11913019 0.85 PRKCA (0.30) PRKCA
SCHEMBL9924516 0.85 PRKCA (0.30) PRKCA
SCHEMBL18350227 0.85 PRKCA (0.38) PRKCA
SCHEMBL18199025 0.84 PRKCA (0.32) PRKCA
SCHEMBL18287692 0.83 PRKCA (0.32) PRKCA
SCHEMBL611378 0.81 HTT (0.32)
SCHEMBL10062509 0.78 HTT (0.36) PRKCA
SCHEMBL13239964 0.77 PRKCA (0.32) PRKCA
SCHEMBL18287678 0.77 TSHR (0.36) PRKCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-20160320699-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-03 US disclosed