SCHEMBL18199025

SCHEMBL18199025

CCC(CCC(F)(F)F)OC(=O)C(C)(C)CC

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.32
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18199013 0.88 CTSK (0.33) PRKCA
SCHEMBL13024716 0.85
SCHEMBL18199035 0.84 PRKCA (0.33) PRKCA
SCHEMBL18350227 0.83 PRKCA (0.38) PRKCA
SCHEMBL8926868 0.81 PRKCA (0.44) PRKCACA1CA2
SCHEMBL14649900 0.81
SCHEMBL21986532 0.80 PRKCA (0.33) PRKCACA1CA2
SCHEMBL13130671 0.79 PRKCA (0.40) PRKCACA1CA2
SCHEMBL18198997 0.79
SCHEMBL21986535 0.78 PRKCA (0.33) PRKCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-20160320699-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-03 US disclosed