SCHEMBL18218331

SCHEMBL18218331

Cc1cc(Cc2cc(C)c(O)c(CO)c2)cc(C=O)c1O

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.72
HMGB1 P09429 1/20 0.42
CXCL12 P48061 1/20 0.42
ERN1 O75460 4/20 0.42
KDM4E B2RXH2 2/20 0.39
CASP6 P55212 1/20 0.39
LMNA P02545 2/20 0.36
MEN1 O00255 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HPGD P15428 1/20 0.36
KMT2A Q03164 1/20 0.36
AOX1 Q06278 1/20 0.36
MAPT P10636 1/20 0.36
TRIM24 O15164 1/20 0.36
TRIM33 Q9UPN9 1/20 0.36
ESR1 P03372 1/20 0.33
ESR2 Q92731 1/20 0.33
PTPN1 P18031 2/20 0.33
PTPN2 P17706 1/20 0.33
PTPN6 P29350 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL209120 0.88 ERN1 (0.52) SHBGHMGB1CXCL12ERN1LMNA
SCHEMBL31612191 0.88 ERN1 (0.52) SHBGHMGB1CXCL12ERN1LMNA
SCHEMBL31612192 0.88 ERN1 (0.52) SHBGHMGB1CXCL12ERN1LMNA
SCHEMBL18218325 0.85 SHBG (0.52) SHBGERN1KDM4ECASP6LMNA
SCHEMBL30315885 0.85 SHBG (1.00) SHBGHMGB1CXCL12KDM4ECASP6
SCHEMBL209447 0.85 SHBG (1.00) SHBGHMGB1CXCL12KDM4ECASP6
SCHEMBL19640087 0.83 ERN1 (0.50) SHBGHMGB1CXCL12ERN1KDM4E
Water SCHEMBL31169663 0.81 SHBG (0.92) SHBGHMGB1CXCL12KDM4ECASP6
SCHEMBL27819945 0.81 HMGB1 (0.49) SHBGHMGB1CXCL12ERN1KDM4E
SCHEMBL1275955 0.78 ERN1 (0.50) SHBGHMGB1CXCL12ERN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720024-B2 Resist underlayer film-forming composition containing indolocarbazole novolak resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-08-08 US disclosed
US-20160326396-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC POLYMER HAVING SECONDARY AMINO GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-11-10 US disclosed