Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 1.00 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.50 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.45 |
| ▸ | CASP6 | P55212 | 1/20 | 0.45 |
| ▸ | ESR1 | P03372 | 2/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.37 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | ALK | Q9UM73 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30315885 | 1.00 | SHBG (1.00) | SHBGHMGB1CXCL12KDM4ECASP6 | |
| Water SCHEMBL31169663 | 0.96 | SHBG (0.92) | SHBGHMGB1CXCL12KDM4ECASP6 | |
| SCHEMBL21096810 | 0.89 | SHBG (0.79) | SHBGHMGB1CXCL12KDM4ECASP6 | |
| SCHEMBL283462 | 0.89 | SHBG (0.80) | SHBGHMGB1CXCL12KDM4ECASP6 | |
| SCHEMBL23864789 | 0.88 | SHBG (0.77) | SHBGHMGB1CXCL12KDM4ECASP6 | |
| SCHEMBL7522709 | 0.87 | SHBG (0.76) | SHBGHMGB1CXCL12KDM4ECASP6 | |
| SCHEMBL10130969 | 0.86 | SHBG (0.74) | SHBGHMGB1CXCL12CA2 | |
| SCHEMBL25446766 | 0.85 | SHBG (0.74) | SHBGHMGB1CXCL12KDM4ECASP6 | |
| SCHEMBL18218331 | 0.85 | SHBG (0.72) | SHBGHMGB1CXCL12KDM4ECASP6 | |
| SCHEMBL29941878 | 0.84 | SHBG (0.73) | SHBGHMGB1CXCL12ESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 433 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119039113-B | Method for preparing 4,4' -methylenebis (2-hydroxymethyl-6-methylphenol) | 天津久日半导体材料有限公司 | 2025-02-07 | — | — | CN | claimed |
| CN-119039113-A | Method for preparing 4,4' -methylenebis (2-hydroxymethyl-6-methylphenol) | 天津久日半导体材料有限公司 | 2024-11-29 | — | — | CN | claimed |
| CN-113831224-B | Synthesis method of 4,4' -methylenebis (2-hydroxymethyl-6-methylphenol) | 辽宁靖帆新材料有限公司 | 2024-02-20 | — | — | CN | claimed |
| WO-2026105628-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026105630-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-14 | — | — | US | disclosed |
| EP-4692943-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | Nissan Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260022203-A1 | SELF-CROSSLINKABLE POLYMER AND RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-01-22 | — | — | US | disclosed |
| EP-4679176-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20080108723-A1 | Photosensitive Resin Composition | TORAY INDUSTRIES, INC. (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20080108723-A1 | Photosensitive Resin Composition | TORAY INDUSTRIES, INC. (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20080075999-A1 | Polyelectrolyte Material, Polyelectrolyte Component, Membrane Electrode Composite Body, and Polyelectrolyte Type Fuel Cell | TORAY INDUSTRIES, INC. (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20040225048-A1 | Vibration damping material composition | TITECS JAPAN CORPORATION (JP) | 2004-11-11 | — | — | US | disclosed |
| EP-1408075-A1 | Vibration damping material composition | Titecs Japan Corporation (JP) | 2004-04-14 | — | — | EP | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
| US-5866724-A | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-02 | — | — | US | disclosed |
| EP-0769485-A1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-04-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | ASH2L, ASIC1, RPA1 | SHBG 4686/4885HMGB1 2409/4885CXCL12 1014/4885 |
| US-20260022203-A1 | SELF-CROSSLINKABLE POLYMER AND RESIST UNDERLAYER FILM FORMING COMPOSITION | SMC2, SMC4, SMC3 | SHBG 1450/4885HMGB1 325/4885CXCL12 2538/4885 |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | SHBG 3960/4885HMGB1 196/4885CXCL12 2060/4885 |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | BHMT, AADAT, PNMT | SHBG 3649/4885HMGB1 1484/4885CXCL12 4240/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.