Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERN1 | O75460 | 11/20 | 0.52 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.52 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.52 |
| ▸ | SHBG | P04278 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.41 |
| ▸ | CDK1 | P06493 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31612192 | 1.00 | ERN1 (0.52) | ERN1HMGB1CXCL12SHBGLMNA | |
| SCHEMBL31612191 | 1.00 | ERN1 (0.52) | ERN1HMGB1CXCL12SHBGLMNA | |
| SCHEMBL27819945 | 0.91 | HMGB1 (0.49) | ERN1HMGB1CXCL12SHBGLMNA | |
| SCHEMBL18218331 | 0.88 | SHBG (0.72) | ERN1HMGB1CXCL12SHBGLMNA | |
| SCHEMBL2729835 | 0.87 | LMNA (0.58) | ERN1LMNAMAPT | |
| SCHEMBL5647563 | 0.86 | ERN1 (0.50) | ERN1HMGB1CXCL12SHBGLMNA | |
| SCHEMBL19640087 | 0.86 | ERN1 (0.50) | ERN1HMGB1CXCL12SHBGLMNA | |
| SCHEMBL9174814 | 0.85 | ERN1 (0.56) | ERN1LMNAMAPTCDK1 | |
| SCHEMBL1275955 | 0.85 | ERN1 (0.50) | ERN1HMGB1CXCL12SHBGLMNA | |
| SCHEMBL31346731 | 0.85 | ERN1 (0.48) | ERN1HMGB1CXCL12SHBGLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120183751-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-RE43067-E1 | Method for producing new polynuclear poly(formylphenol) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-RE43067-E1 | Method for producing new polynuclear poly(formylphenol) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-7875743-B2 | such as bis(3-formyl-4-(4-methoxycarbonylphenyl)methoxyphenyl)methane, by reacting bis(hydroxymethyl-hydroxyphenyl)alkane with hexamethylene tetramine in presence of acid and hydrolyzing, then reacting with halogenated alkoxycarbonyl hydrocarbon in presence of base | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-01-25 | — | — | US | disclosed |
| US-7750190-B2 | reacting hexamethylene tetramine in presence of acid; industrial scale; photoresists | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2010-07-06 | — | — | US | disclosed |
| US-7750190-B2 | reacting hexamethylene tetramine in presence of acid; industrial scale; photoresists | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2010-07-06 | — | — | US | disclosed |
| US-7750190-B2 | reacting hexamethylene tetramine in presence of acid; industrial scale; photoresists | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2010-07-06 | — | — | US | disclosed |
| US-20100016633-A1 | such as bis(3-formyl-4-(4-methoxycarbonylphenyl)methoxyphenyl)methane, by reacting bis(hydroxymethyl-hydroxyphenyl)alkane with hexamethylene tetramine in presence of acid and hydrolyzing, then reacting with halogenated alkoxycarbonyl hydrocarbon in presence of base | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2010-01-21 | — | — | US | disclosed |
| US-20090182175-A1 | METHOD FOR PRODUCING NEW POLYNUCLEAR POLY(FORMYLPHENOL) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2009-07-16 | — | — | US | disclosed |
| US-20090182175-A1 | METHOD FOR PRODUCING NEW POLYNUCLEAR POLY(FORMYLPHENOL) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2009-07-16 | — | — | US | disclosed |
| US-20090182175-A1 | METHOD FOR PRODUCING NEW POLYNUCLEAR POLY(FORMYLPHENOL) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2009-07-16 | — | — | US | disclosed |
| US-20070232839-A1 | NOVEL POLYNUCLEAR POLYPHENOL COMPOUND | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070232839-A1 | NOVEL POLYNUCLEAR POLYPHENOL COMPOUND | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070232839-A1 | NOVEL POLYNUCLEAR POLYPHENOL COMPOUND | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090182175-A1 | METHOD FOR PRODUCING NEW POLYNUCLEAR POLY(FORMYLPHENOL) | PCBP1, FPR2, PNKP | ERN1 2895/4885HMGB1 1119/4885CXCL12 4541/4885 |
| US-20070232839-A1 | NOVEL POLYNUCLEAR POLYPHENOL COMPOUND | TPR, PCNA, NCOA4 | ERN1 3435/4885HMGB1 326/4885CXCL12 4528/4885 |
| US-20120183751-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME | RER1, SUN2, POLR1G | ERN1 2341/4885HMGB1 1533/4885CXCL12 3812/4885 |
| US-20100016633-A1 | such as bis(3-formyl-4-(4-methoxycarbonylphenyl)methoxyphenyl)methane, by reacting bis(hydroxymethyl-hydroxyphenyl)alkane with hexamethylene tetramine in presence of acid and hydrolyzing, then reacting with halogenated alkoxycarbonyl hydrocarbon in presence of base | PAH, PGM2, HNMT | ERN1 3647/4885HMGB1 669/4885CXCL12 3290/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.