Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | SHBG | P04278 | 1/20 | 0.34 |
| ▸ | FDPS | P14324 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14616328 | 0.94 | FDPS (0.35) | FDPSCYP2C9 | |
| SCHEMBL2190883 | 0.91 | ACHE (0.44) | ACHESHBGCYP1A2CYP2D6CYP2C9 | |
| SCHEMBL14616322 | 0.83 | ACHE (0.34) | ACHESHBG | |
| SCHEMBL13559928 | 0.82 | ACHE (0.37) | ACHESHBG | |
| SCHEMBL13559716 | 0.81 | ACHE (0.36) | ACHESHBG | |
| SCHEMBL2193666 | 0.79 | ACHE (0.40) | ACHESHBGCYP1A2CYP2D6CYP2C9 | |
| SCHEMBL28308729 | 0.78 | ACHE (0.58) | ACHECYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL18220628 | 0.78 | ACHE (0.42) | ACHECYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13518648 | 0.75 | ACHE (0.39) | ACHECYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13518477 | 0.75 | ACHE (0.44) | ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9798234-B2 | Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask | FUJIFILM CORPORATION (JP) | 2017-10-24 | — | — | US | disclosed |
| US-9798234-B2 | Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask | FUJIFILM CORPORATION (JP) | 2017-10-24 | — | — | US | disclosed |
| US-20160327862-A1 | RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTO MASK | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20160327862-A1 | RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTO MASK | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |