Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.44 |
| ▸ | SHBG | P04278 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | ESR1 | P03372 | 2/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.33 |
| ▸ | MAOA | P21397 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14616322 | 0.91 | ACHE (0.34) | ACHESHBG | |
| SCHEMBL18220627 | 0.91 | ACHE (0.37) | ACHESHBGCYP1A2CYP2D6CYP2C9 | |
| SCHEMBL13559928 | 0.91 | ACHE (0.37) | ACHESHBG | |
| SCHEMBL13559716 | 0.89 | ACHE (0.36) | ACHESHBGESR1ESR2 | |
| SCHEMBL2193666 | 0.87 | ACHE (0.40) | ACHESHBGCYP1A2CYP2D6CYP2C9 | |
| SCHEMBL28308729 | 0.87 | ACHE (0.58) | ACHECYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL18220628 | 0.86 | ACHE (0.42) | ACHECYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL14616328 | 0.83 | FDPS (0.35) | CYP2C9 | |
| SCHEMBL8346849 | 0.79 | ACHE (0.71) | ACHESHBGCYP1A2CYP2D6CYP2C9 | |
| SCHEMBL20225253 | 0.79 | ACHE (0.71) | ACHESHBGCYP1A2CYP2D6CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9798234-B2 | Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask | FUJIFILM CORPORATION (JP) | 2017-10-24 | — | — | US | disclosed |
| US-9798234-B2 | Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask | FUJIFILM CORPORATION (JP) | 2017-10-24 | — | — | US | disclosed |
| US-9651864-B2 | Negative resist composition, method for producing relief pattern using the same, and electronic component using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9651864-B2 | Negative resist composition, method for producing relief pattern using the same, and electronic component using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9522868-B2 | Tetrakis(ether-substituted formylphenyl) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-9522868-B2 | Tetrakis(ether-substituted formylphenyl) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-9522868-B2 | Tetrakis(ether-substituted formylphenyl) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160327862-A1 | RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTO MASK | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20160327862-A1 | RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTO MASK | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20160016884-A1 | NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-01-21 | — | — | US | disclosed |
| US-20130017376-A1 | NEGATIVE RESIST COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING THE SAME, AND ELECTRONIC COMPONENT USING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20130017376-A1 | NEGATIVE RESIST COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING THE SAME, AND ELECTRONIC COMPONENT USING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20120277479-A1 | NOVEL POLYNUCLEAR POLY(PHENOL) FAMILY | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-11-01 | — | — | US | disclosed |
| US-20120277479-A1 | NOVEL POLYNUCLEAR POLY(PHENOL) FAMILY | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-11-01 | — | — | US | disclosed |
| US-8278022-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-02 | — | — | US | disclosed |
| US-20110172457-A1 | TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) AND NEW POLYNUCLEAR POLYPHENOL DERIVED FROM THE SAME | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110172457-A1 | TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) AND NEW POLYNUCLEAR POLYPHENOL DERIVED FROM THE SAME | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110172457-A1 | TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) AND NEW POLYNUCLEAR POLYPHENOL DERIVED FROM THE SAME | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20090317745-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD (JP) | 2009-12-24 | — | — | US | disclosed |
| WO-2009154291-A1 | NOVEL TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) AND NOVEL POLYNUCLEAR POLY(PHENOL) DERIVED FROM THE SAME | 本州化学工業株式会社 (JP) | 2009-12-23 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160016884-A1 | NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) | AHR, PAH, ALK | ACHE 4873/4885SHBG 2278/4885CYP1A2 68/4885 |
| US-20120277479-A1 | NOVEL POLYNUCLEAR POLY(PHENOL) FAMILY | PAH, C1S, AP1S1 | ACHE 3989/4885SHBG 2056/4885CYP1A2 702/4885 |
| US-20110172457-A1 | TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) AND NEW POLYNUCLEAR POLYPHENOL DERIVED FROM THE SAME | AHR, PAH, ARNT | ACHE 4301/4885SHBG 1452/4885CYP1A2 353/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.