Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1C3 | P42330 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | FBP1 | P09467 | 2/20 | 0.42 |
| ▸ | DHODH | Q02127 | 1/20 | 0.41 |
| ▸ | TRPM8 | Q7Z2W7 | 1/20 | 0.41 |
| ▸ | KDM1A | O60341 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL140742 | 0.77 | ALDH1A1 (0.54) | AKR1C3ALDH1A1TSHRHTTFBP1 | |
| SCHEMBL23458002 | 0.76 | AKR1C3 (0.73) | AKR1C3ALDH1A1TSHRHTTFBP1 | |
| SCHEMBL6433811 | 0.76 | AKR1C3 (0.73) | AKR1C3ALDH1A1TSHRHTTFBP1 | |
| SCHEMBL8072809 | 0.73 | ALDH1A1 (0.48) | AKR1C3ALDH1A1TSHRFBP1KDM1A | |
| SCHEMBL8850430 | 0.72 | AKR1C3 (0.88) | AKR1C3ALDH1A1TSHRHTTFBP1 | |
| SCHEMBL4758975 | 0.72 | AKR1C3 (0.60) | AKR1C3ALDH1A1TSHRHTTFBP1 | |
| SCHEMBL5342048 | 0.72 | AKR1C3 (0.67) | AKR1C3ALDH1A1TSHRHTTFBP1 | |
| SCHEMBL5342051 | 0.72 | AKR1C3 (0.67) | AKR1C3ALDH1A1TSHRHTTFBP1 | |
| SCHEMBL13119929 | 0.72 | AKR1C3 (0.60) | AKR1C3ALDH1A1TSHRHTTFBP1 | |
| Acetic Acid SCHEMBL6897109 | 0.71 | AKR1C3 (0.95) | AKR1C3ALDH1A1TSHRHTTFBP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5525457-A | Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-06-11 | — | — | US | claimed |
| EP-1703327-B1 | Composition for forming antireflection film, laminate, and method for forming resist pattern | JSR CORP (JP) | 2011-05-11 | — | — | EP | disclosed |
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-7514205-B2 | Composition for forming antireflection film, laminate, and method for forming resist pattern | JSR CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| US-20060223008-A1 | Composition for forming antireflection film, laminate, and method for forming resist pattern | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| EP-1703327-A2 | Composition for forming antireflection film, laminate, and method for forming resist pattern | JSR Corporation (JP) | 2006-09-20 | — | — | EP | disclosed |
| EP-0683185-B1 | (Meth)acrylate copolymer and elastomer compositions comprising said copolymer | SUMITOMO CHEMICAL CO (JP) | 1999-03-31 | — | — | EP | disclosed |
| EP-0583918-B1 | Reflection preventing film and process for forming resist pattern using the same | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1999-03-10 | — | — | EP | disclosed |
| US-5610226-A | ELASTOMER OF COPOLYMER, CARBON BLACK AND A CROSSLINKING AGENT, AND RUBBER OBTAINED BY VULCANIZING ELASTOMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-03-11 | — | — | US | disclosed |
| US-5525457-A | Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-06-11 | — | — | US | disclosed |
| US-5410005-A | Comprising acrylic amide and ester copolymers and their salts, having carboxyl and sulfonic acid groups as well as fluoro | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-04-25 | — | — | US | disclosed |
| EP-0583918-A2 | Reflection preventing film and process for forming resist pattern using the same | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-02-23 | — | — | EP | disclosed |
| EP-0367577-B1 | Novel ester group-containing (meth) acrylic acid ester, novel (co)polymer thereof, composition comprising the (co) polymer and composition comprising the ester group- containing (meth) acrylic acid ester | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-01-05 | — | — | EP | disclosed |
| US-5026807-A | Heat and cold resistance; oil repellents | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-06-25 | — | — | US | disclosed |
| EP-0367577-A1 | Novel ester group-containing (meth) acrylic acid ester, novel (co)polymer thereof, composition comprising the (co) polymer and composition comprising the ester group- containing (meth) acrylic acid ester | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-05-09 | — | — | EP | disclosed |