⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18288155 | 0.64 | — | — | |
| SCHEMBL196799 | 0.54 | MEN1 (0.48) | — | |
| SCHEMBL548187 | 0.54 | GABRA1 (0.45) | — | |
| SCHEMBL18802760 | 0.54 | ALDH1A1 (0.40) | — | |
| SCHEMBL10596214 | 0.54 | MEN1 (0.35) | — | |
| SCHEMBL11779315 | 0.54 | — | — | |
| SCHEMBL10596219 | 0.54 | MEN1 (0.35) | — | |
| SCHEMBL626590 | 0.51 | — | — | |
| SCHEMBL2549456 | 0.51 | — | — | |
| SCHEMBL9680302 | 0.51 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9772555-B2 | Methods of forming patterns using photoresists | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-09-26 | — | — | US | disclosed |
| US-9772555-B2 | Methods of forming patterns using photoresists | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-09-26 | — | — | US | disclosed |
| US-20160358778-A1 | METHODS OF FORMING PATTERNS USING PHOTORESISTS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-12-08 | — | — | US | disclosed |
| US-20160358778-A1 | METHODS OF FORMING PATTERNS USING PHOTORESISTS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-12-08 | — | — | US | disclosed |