SCHEMBL548187

SCHEMBL548187

CC(C)(O)c1cc(C(C)(C)O)cc(C(C)(C)O)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 1/20 0.45
GABRB2 P47870 1/20 0.45
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
ESR1 P03372 3/20 0.35
ESR2 Q92731 2/20 0.35
ALDH1A1 P00352 3/20 0.33
ALOX15 P16050 3/20 0.33
HPGD P15428 3/20 0.33
HSD17B10 Q99714 3/20 0.33
TDP1 Q9NUW8 2/20 0.33
CYP3A4 P08684 2/20 0.33
TSHR P16473 2/20 0.33
KDM4E B2RXH2 1/20 0.33
CYP1A2 P05177 1/20 0.33
MAPT P10636 1/20 0.33
ATP2A2 P16615 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
ATP2A3 Q93084 1/20 0.33
ALOX12 P18054 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8985984 0.90 MEN1 (0.42) GABRA1GABRB2MEN1KMT2AESR1
SCHEMBL3969052 0.90 GABRA1 (0.60) GABRA1GABRB2MEN1KMT2AALDH1A1
SCHEMBL547694 0.90 RXRB (0.40) GABRA1GABRB2MEN1KMT2AESR1
SCHEMBL7764602 0.90 GABRA1 (0.60) GABRA1GABRB2MEN1KMT2AALDH1A1
SCHEMBL18802839 0.90 ALOX15 (0.46) GABRA1GABRB2MEN1KMT2AESR1
SCHEMBL18288154 0.87 PGK1 (0.43) GABRA1GABRB2ESR1ALDH1A1HSD17B10
SCHEMBL548086 0.87 GABRA1 (0.65) GABRA1GABRB2ESR1ESR2ALDH1A1
SCHEMBL24030011 0.85 MEN1 (0.37) GABRA1GABRB2MEN1KMT2AAR
SCHEMBL7216715 0.85 CES2 (0.48) GABRA1GABRB2MEN1KMT2AMAPT
SCHEMBL22013510 0.85 GABRA1 (0.36) GABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 216 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130281742-A1 METHOD AND SYNTHESIS OF INITIATORS FOR TELECHELIC POLYISOBUTYLENES THE UNIVERSITY OF AKRON (US) 2013-10-24 US claimed
EP-0579058-B1 Butyl rubber with a bimodal molecular weight distribution BAYER RUBBER INC (CA) 1996-05-29 EP claimed
US-RE34640-E Polymerizing isobutylene, adding monomer to make block polymer; metal halide, initiator and electron pair doner solvent UNIVERSITY OF AKRON (US) 1994-06-14 US claimed
US-5284982-A Aromatization to 1,3,5-tris/alpha-hydroxyisopropyl/benzene; using catalysts of nickel phosphite, organoaluminum and magnesium components HUELS AKTIENGESELLSCHAFT (DE) 1994-02-08 US claimed
EP-0579058-A1 Butyl rubber with a bimodal molecular weight distribution BAYER RUBBER INC. (CA) 1994-01-19 EP claimed
US-5194538-A Hydroxy Initiators POLYSAR CORPORATION (CA) 1993-03-16 US claimed
WO-1991011468-A1 NEW THERMOPLASTIC ELASTOMERS THE UNIVERSITY OF AKRON (US) 1991-08-08 WO claimed
US-4946899-A CARBOCATIONIC POLYMERIZATION INVOLVING HOMOPOLYMERIZATION OF ELASTOMER FOLLOWED BY COPOLYMERIZATION TO ADD GLASSY SEGMENTS; FORMING LIVING POLYMERS WITH A METAL HALIDE, PROMOTER AND SOLVENT MIXTURE THE UNIVERSITY OF AKRON (US) 1990-08-07 US claimed
JP-6009459-A None JP disclosed
US-12547074-B2 Photosensitive resin composition, method for producing patterned cured film, patterned cured film and semiconductor element RESONAC CORPORATION (JP) 2026-02-10 US disclosed
US-12091489-B1 Multiply-crosslinked polyisobutylene-based polyurethanes and their preparations and uses thereof KENU BIOMATERIALS, LLC 2024-09-17 US disclosed
US-11852970-B2 Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-26 US disclosed
US-20230324789-A1 PHOTOSENSITIVE RESIN COMPOSITION, PERMANENT RESIST, METHOD FOR FORMING PERMANENT RESIST, AND METHOD FOR INSPECTING PERMANENT RESIST CURED FILM RESONAC CORPORATION (JP) 2023-10-12 US disclosed
US-20230236508-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT RESONAC CORPORATION (JP) 2023-07-27 US disclosed
EP-0273990-A1 Novel organic peroxides and their use in the preparation of epoxide groups containing (co)polymers AKZO N.V. (NL) 1988-07-13 EP disclosed
EP-0263259-A2 Process and catalyst system for the trimerization of acetylene and acetylene compounds HÜLS AKTIENGESELLSCHAFT (DE) 1988-04-13 EP disclosed
US-4728702-A COUPLING WITH COUPLING AGENT ENICHEM ELASTOMERI S.P.A. (IT) 1988-03-01 US disclosed
US-4633010-A INTERMEDIATE FOR TRIISOCYANATE USED IN COATINGS AMERICAN CYANAMID COMPANY (US) 1986-12-30 US disclosed
EP-0193252-A1 Method for the termination of living polymers and compound suitable to that purpose ENICHEM ELASTOMERI S.p.A. (IT) 1986-09-03 EP disclosed
EP-0161021-A2 Method for the termination of living polymers and compounds suitable to that purpose ENICHEM ELASTOMERI S.p.A. (IT) 1985-11-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130281742-A1 METHOD AND SYNTHESIS OF INITIATORS FOR TELECHELIC POLYISOBUTYLENES TET1, TET3, DNMT1 GABRA1 1294/4885GABRB2 397/4885MEN1 4367/4885
US-11852970-B2 Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin SLC39A11, CROCC, TERB1 GABRA1 3202/4885GABRB2 4213/4885MEN1 1260/4885
US-12547074-B2 Photosensitive resin composition, method for producing patterned cured film, patterned cured film and semiconductor element JMJD6, RARA, BCR GABRA1 1827/4885GABRB2 2063/4885MEN1 3431/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.