⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18315995 | 0.82 | — | — | |
| SCHEMBL2566448 | 0.80 | ALOX15 (0.33) | — | |
| SCHEMBL16862751 | 0.74 | — | — | |
| SCHEMBL19970538 | 0.73 | ALDH1A1 (0.31) | — | |
| SCHEMBL555039 | 0.71 | — | — | |
| SCHEMBL10863724 | 0.71 | ALOX15 (0.32) | — | |
| SCHEMBL15796950 | 0.69 | THRB (0.35) | — | |
| SCHEMBL514548 | 0.69 | — | — | |
| SCHEMBL16390384 | 0.69 | — | — | |
| SCHEMBL1136162 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115135803-A | Electroless plating base agent comprising polymer and metal fine particles | 日产化学株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-110256630-B | Resin composition for forming phase difference material, alignment material, and phase difference material | 日产化学工业株式会社 | 2021-09-28 | — | — | CN | disclosed |
| CN-113195788-A | Electroless plating base agent comprising polymer and metal fine particles | 日产化学株式会社 | 2021-07-30 | — | — | CN | disclosed |
| CN-111868302-A | Electroless plating base agent comprising polymer and metal fine particles | 日产化学株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-105378033-B | Method for manufacturing substrate having liquid crystal alignment film for in-plane switching liquid crystal display element | 日产化学工业株式会社 | 2020-10-27 | — | — | CN | disclosed |
| US-10590219-B2 | Retardation material-forming resin composition, orientation material, and retardation material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-03-17 | — | — | US | disclosed |
| CN-107406720-B | Composition for forming cured film, alignment material, and phase difference material | 日产化学工业株式会社 | 2020-03-06 | — | — | CN | disclosed |
| US-20180355087-A1 | RETARDATION MATERIAL-FORMING RESIN COMPOSITION, ORIENTATION MATERIAL, AND RETARDATION MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-12-13 | — | — | US | disclosed |
| US-10081693-B2 | Retardation material-forming resin composition, orientation material, and retardation material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-09-25 | — | — | US | disclosed |
| US-20160369025-A1 | RETARDATION MATERIAL-FORMING RESIN COMPOSITION, ORIENTATION MATERIAL, AND RETARDATION MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-22 | — | — | US | disclosed |