⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18457094 | 0.74 | ALDH1A1 (0.39) | — | |
| SCHEMBL18634199 | 0.72 | THRB (0.33) | — | |
| SCHEMBL14300827 | 0.70 | — | — | |
| SCHEMBL11296271 | 0.68 | HPGD (0.42) | — | |
| SCHEMBL16372343 | 0.66 | ALDH1A1 (0.37) | — | |
| SCHEMBL18768275 | 0.66 | ALDH1A1 (0.38) | — | |
| SCHEMBL19335284 | 0.65 | — | — | |
| SCHEMBL17938182 | 0.64 | ALDH1A1 (0.36) | — | |
| SCHEMBL14295908 | 0.64 | — | — | |
| SCHEMBL6920723 | 0.64 | ALDH1A1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9720324-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20170031243-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-02 | — | — | US | disclosed |