SCHEMBL19335284

SCHEMBL19335284

CC(=O)OCC1CC2CC1C(O)(C(F)(F)F)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18457094 0.87 ALDH1A1 (0.39) —
SCHEMBL20691777 0.82 — —
SCHEMBL18634199 0.77 THRB (0.33) —
SCHEMBL20691782 0.72 — —
SCHEMBL20820945 0.71 — —
SCHEMBL18768277 0.70 NLRP3 (0.30) —
SCHEMBL22722426 0.68 ALDH1A1 (0.42) —
SCHEMBL18457103 0.68 ALDH1A1 (0.42) —
SCHEMBL19151715 0.67 ALDH1A1 (0.31) —
SCHEMBL18758177 0.66 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180134860-A1 STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-17 — — US disclosed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 — — US disclosed
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