⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20342010 | 0.82 | NPSR1 (0.31) | — | |
| SCHEMBL22336436 | 0.75 | NPSR1 (0.31) | — | |
| SCHEMBL21420108 | 0.74 | — | — | |
| SCHEMBL18561114 | 0.72 | NPSR1 (0.30) | — | |
| SCHEMBL18470632 | 0.71 | ALDH1A1 (0.33) | — | |
| SCHEMBL18470418 | 0.69 | TSHR (0.35) | — | |
| SCHEMBL11991287 | 0.68 | CYP17A1 (0.38) | — | |
| SCHEMBL18470420 | 0.68 | NPSR1 (0.30) | — | |
| SCHEMBL21505906 | 0.67 | — | — | |
| SCHEMBL19596887 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-9897916-B2 | Compound, polymer compound, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-20170038683-A1 | COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-09 | — | — | US | disclosed |