⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21251557 | 0.86 | — | — | |
| SCHEMBL13079566 | 0.74 | POLB (0.38) | — | |
| SCHEMBL22364001 | 0.74 | POLB (0.38) | — | |
| SCHEMBL19853137 | 0.73 | ALDH1A1 (0.33) | — | |
| SCHEMBL18476387 | 0.72 | ALDH1A1 (0.32) | — | |
| SCHEMBL20342010 | 0.72 | NPSR1 (0.31) | — | |
| SCHEMBL20014036 | 0.70 | CYP17A1 (0.31) | — | |
| SCHEMBL18470418 | 0.70 | TSHR (0.35) | — | |
| SCHEMBL20403888 | 0.70 | ALDH1A1 (0.32) | — | |
| SCHEMBL14999029 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4276533-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-11-15 | — | — | EP | disclosed |
| EP-4276534-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-11-15 | — | — | EP | disclosed |
| EP-4270108-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-11-01 | — | — | EP | disclosed |
| EP-4047418-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2023-08-16 | — | — | EP | disclosed |
| EP-4047417-B1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2023-08-16 | — | — | EP | disclosed |
| EP-3127928-B1 | POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2017-11-15 | — | — | EP | disclosed |